Abstract: An apparatus for self cleaning a thermal oxidizer that is thermally treating and decontaminating gases is disclosed. The apparatus for self cleaning the thermal oxidizer can clean the accumulated dust out from inside the thermal oxidizer without requiring disassembly of the unit. The apparatus for self cleaning can also accomplish this cleaning cycle without interrupting the normal operation of the thermal oxidizer. Dust cleaned out from the apparatus for self cleaning the thermal oxidizer is decontaminated by the same thermal treatment that decontaminates the gases processed by the thermal oxidizer. Many of the existing thermal oxidizers already in operation can be retrofitted to become self cleaning thermal oxidizers. It is also possible to include the apparatus for self cleaning in a new thermal oxidizer.