Patents by Inventor ROBERT DINSMORE

ROBERT DINSMORE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • In situ chamber clean with inert hydrogen helium mixture during wafer process
    Patent number: 9269562
    Abstract: Embodiments of the present invention generally relate to a method for cleaning a processing chamber during substrate processing. During a first substrate processing step, a plasma is formed from a gas mixture of argon, helium, and hydrogen in the processing chamber. In a second substrate processing step, an argon plasma is formed in the processing chamber.
    Type: Grant
    Filed: January 17, 2013
    Date of Patent: February 23, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Robert Dinsmore, John C. Forster, Song-Moon Suh, Cheng-Hsiung Tsai, Glen T. Mori
  • Two piece shutter disk assembly for a substrate process chamber
    Patent number: 9252002
    Abstract: Shutter disk assemblies for use in process chambers to protect a substrate support disposed below the shutter disk assembly from undesired material deposition are provided herein. In some embodiments, a shutter disk assembly for use in a process chamber to protect a substrate support disposed below the shutter disk assembly may include an upper disk member having a top surface and a bottom surface; and a lower carrier member having at least a portion of the lower carrier member disposed below a portion of the upper disk member to support the upper disk member and to create a protective overlap region that prevents exposure of the substrate support upon deformation of the upper disk member.
    Type: Grant
    Filed: July 17, 2012
    Date of Patent: February 2, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Cheng-Hsiung Matthew Tsai, Ananthkrishna Jupudi, Robert Dinsmore, Song-Moon Suh
  • Finned shutter disk for a substrate process chamber
    Patent number: 9147558
    Abstract: Shutter disks for use in process chambers are provided herein. In some embodiments, a shutter disk for use in a process chamber may include a body having an outer perimeter, a top surface of the body, wherein the top surface includes a central portion having a substantially horizontal planar surface, and at least one angled structure disposed radially outward of the central portion, each of the at least one angled structure having a top portion and an angled surface disposed at a downward angle in a radially outward direction from the top portion toward the outer perimeter, and a bottom surface of the body.
    Type: Grant
    Filed: January 16, 2013
    Date of Patent: September 29, 2015
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Bonnie T. Chia, Song-Moon Suh, Cheng-Hsiung Matthew Tsai, Robert Dinsmore, Glen T. Mori
  • IN SITU CHAMBER CLEAN WITH INERT HYDROGEN HELIUM MIXTURE DURING WAFER PROCESS
    Publication number: 20140196746
    Abstract: Embodiments of the present invention generally relate to a method for cleaning a processing chamber during substrate processing. During a first substrate processing step, a plasma is formed from a gas mixture of argon, helium, and hydrogen in the processing chamber. In a second substrate processing step, an argon plasma is formed in the processing chamber.
    Type: Application
    Filed: January 17, 2013
    Publication date: July 17, 2014
    Inventors: Robert Dinsmore, John C. Forster, Song-Moon Sun, Cheng-Hsiung Tsai, Glen T. Mori
  • FINNED SHUTTER DISK FOR A SUBSTRATE PROCESS CHAMBER
    Publication number: 20140196848
    Abstract: Shutter disks for use in process chambers are provided herein. In some embodiments, a shutter disk for use in a process chamber may include a body having an outer perimeter, a top surface of the body, wherein the top surface includes a central portion having a substantially horizontal planar surface, and at least one angled structure disposed radially outward of the central portion, each of the at least one angled structure having a top portion and an angled surface disposed at a downward angle in a radially outward direction from the top portion toward the outer perimeter, and a bottom surface of the body.
    Type: Application
    Filed: January 16, 2013
    Publication date: July 17, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventors: BONNIE T. CHIA, SONG-MOON SUH, CHENG-HSIUNG MATTHEW TSAI, ROBERT DINSMORE, GLEN T. MORI
  • TWO PIECE SHUTTER DISK ASSEMBLY FOR A SUBSTRATE PROCESS CHAMBER
    Publication number: 20140020629
    Abstract: Shutter disk assemblies for use in process chambers to protect a substrate support disposed below the shutter disk assembly from undesired material deposition are provided herein. In some embodiments, a shutter disk assembly for use in a process chamber to protect a substrate support disposed below the shutter disk assembly may include an upper disk member having a top surface and a bottom surface; and a lower carrier member having at least a portion of the lower carrier member disposed below a portion of the upper disk member to support the upper disk member and to create a protective overlap region that prevents exposure of the substrate support upon deformation of the upper disk member.
    Type: Application
    Filed: July 17, 2012
    Publication date: January 23, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventors: CHENG-HSIUNG MATTHEW TSAI, ANANTHKRISHNA JUPUDI, ROBERT DINSMORE, SONG-MOON SUH