Patents by Inventor Robert Douglas Watso

Robert Douglas Watso has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 10175585
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Grant
    Filed: August 29, 2014
    Date of Patent: January 8, 2019
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Robert Douglas Watso, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Antonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
  • Lithographic apparatus and contamination removal or prevention method
    Patent number: 9599908
    Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: March 21, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
  • LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD
    Publication number: 20160033875
    Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
    Type: Application
    Filed: October 9, 2015
    Publication date: February 4, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans JANSEN, Martinus Hendrikus Antonius LEENDERS, Antonius Johannus VAN DER NET, Peter Franciscus WANTEN, Jacques Cor Johan VAN DER DONCK, Robert Douglas WATSO, Teunis Cornelis VAN DEN DOOL, Nadja SCHUH, Jan Willem CROMWIJK
  • Lithographic apparatus and contamination removal or prevention method
    Patent number: 9158206
    Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
    Type: Grant
    Filed: February 22, 2011
    Date of Patent: October 13, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
  • Lithographic apparatus, reflective member and a method of irradiating the underside of a liquid supply system
    Patent number: 9019466
    Abstract: A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system. The construction of the reflector is also described as is a method for irradiating the underside of a liquid supply system for use in cleaning.
    Type: Grant
    Filed: September 27, 2007
    Date of Patent: April 28, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Martinus Hendrikus Antonius Leenders, Youri Johannes Laurentius Maria Van Dommelen, Hans Jansen, Robert Douglas Watso, Anthonius Martinus Cornelis Petrus De Jong, Jan Willem Cromwijk, Thomas Laursen
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20150055102
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Application
    Filed: August 29, 2014
    Publication date: February 26, 2015
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Robert Douglas WATSO, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Antonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 8823918
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Grant
    Filed: April 22, 2009
    Date of Patent: September 2, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Robert Douglas Watso, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Anthonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
  • LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD
    Publication number: 20110188013
    Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
    Type: Application
    Filed: February 22, 2011
    Publication date: August 4, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
  • Lithographic apparatus and contamination removal or prevention method
    Patent number: 7916269
    Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
    Type: Grant
    Filed: September 27, 2007
    Date of Patent: March 29, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20090284715
    Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
    Type: Application
    Filed: April 22, 2009
    Publication date: November 19, 2009
    Applicant: ASML NETHERLAND B.V.
    Inventors: Robert Douglas Watso, Youri Johannes Laurentius Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Anthonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
  • Lithographic Apparatus, Reflective Member And A Method of Irradiating The Underside Of A Liquid Supply System
    Publication number: 20090027636
    Abstract: A lithographic apparatus that includes a reflector configured to reflect a cleaning beam of radiation projected through a projection system onto an underside of a liquid retrieval system is disclosed. The construction of the reflector is also disclosed as is a method for irradiating the underside of a liquid supply system for use in cleaning.
    Type: Application
    Filed: September 27, 2007
    Publication date: January 29, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Martinus Hendrikus Antonius LEENDERS, Youri Johannes Laurentius Van Dommelen, Hans Jansen, Robert Douglas Watso, Anthonius Martinus Petrus De Jong, Jan Willem Cromwijk, Thomas Laursen
  • Lithographic Apparatus and Contamination Removal or Prevention Method
    Publication number: 20090027635
    Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
    Type: Application
    Filed: September 27, 2007
    Publication date: January 29, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans Jansen, Martinus Hendrikus Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk
  • Lithographic Apparatus And Contamination Removal Or Prevention Method
    Publication number: 20090025753
    Abstract: A lithographic apparatus is disclosed having an in situ ozonizer, which is used to produce ozone gas, for example, by UV irradiation of an oxygen-containing gas. The thus produced ozone is dissolved in ultra-pure water by contacting the ozone with the ultra-pure water through a permeable membrane.
    Type: Application
    Filed: September 27, 2007
    Publication date: January 29, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Anthonius Martinus Cornelis Petrus DE JONG, Hans Jansen, Martinus Hendrikus Antonius Leenders, Antonius Johannus Van Der Net, Peter Franciscus Wanten, Jacques Cor Johan Van Der Donck, Robert Douglas Watso, Teunis Cornelis Van Den Dool, Nadja Schuh, Jan Willem Cromwijk