Abstract: A device for hydroplane polishing an exposed face of a sample includes a sample support having freedom of movement in a direction perpendicular to the exposed face; a polishing member having a surface opposite the exposed face; and a polishing fluid source for directing polishing fluid to a limited zone in the vicinity of the exposed face at sufficient pressure to cause the exposed face to hydroplane relative to the surface. Also, a device for rotating a sample relative to a surface for polishing a face of the sample using fluid in the space between the sample face and the surface includes a sample support held in a housing by an air bearing, and a source of air flow for rotating the support. Also, a device for hydroplane polishing includes a positive drive to rotate the sample support. Also, a device for polishing an exposed face of a sample includes a positive drive to rotate the sample and a positive drive to rotate the polishing member.