Patents by Inventor Robert E. Doane

Robert E. Doane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5348723
    Abstract: Semiconductor grade tungsten hexafluoride (WF.sub.6) is produced by reacting tungsten metal with a recirculating flow of gaseous WF.sub.6 containing a small concentration of fluorine in a heated reactor. The high purity WF.sub.6 produced is useful for deposition of tungsten metallization in fabricating VLSI integrated circuitry.
    Type: Grant
    Filed: February 7, 1990
    Date of Patent: September 20, 1994
    Assignee: Bandgap Technology Corporation
    Inventors: Bruce J. Sabacky, Robert E. Doane
  • Patent number: 5328668
    Abstract: Semiconductor grade tungsten hexafluoride (WF.sub.6) is produced by reacting tungsten metal with a recirculating flow of gaseous WF.sub.6 containing a small concentration of fluorine in a heated reactor. The high purity WF.sub.6 produced is useful for deposition of tungsten metallization in fabricating VLSI integrated circuitry.
    Type: Grant
    Filed: May 24, 1990
    Date of Patent: July 12, 1994
    Assignee: Bandgap Chemical Corporation
    Inventors: Bruce J. Sabacky, Robert E. Doane
  • Patent number: 5324498
    Abstract: A process is provided for purifying liquid tungsten hexafluoride containing volatile and non-volatile impurities. The process comprises the steps of evaporating tungsten hexafluoride from non-volatile impurities dissolved in liquid tungsten hexafluoride and condensing the evaporated tungsten hexafluoride. The condensed tungsten hexafluoride is subjected to freezing to solidify the tungsten hexafluoride. Volatile impurities are then evacuated from the solid tungsten hexafluoride. Thereafter, the solid tungsten hexafluoride is thawed to liquid tungsten hexafluoride to release trapped volatile impurities and then heated to a temperature above the boiling point of tungsten hexafluoride under pressure in a closed container. The volatile impurities dissolved in the thawed tungsten hexafluoride are removed and collected above the thawed tungsten hexafluoride and vented into an evacuated space.
    Type: Grant
    Filed: March 30, 1990
    Date of Patent: June 28, 1994
    Assignee: Bandgap Chemical Corporation
    Inventors: Barry J. Streusand, Don A. Almond, Robert E. Doane
  • Patent number: 4415542
    Abstract: The scaling of autoclave and leaching-equipment surfaces during the high pressure leaching of nickeliferous oxide and silicate ores is controlled during leaching to favor the formation of scale containing substantial amounts of magnesium sulfate that is more easily removed by chemical dissolution using water or dilute sulfuric acid at temperatures ranging from about 50.degree. C. to 250.degree. C. than scale containing substantial amounts of alunite.
    Type: Grant
    Filed: June 21, 1982
    Date of Patent: November 15, 1983
    Assignee: Compagne Francaise D'Entreprises Minieres, Metallurgiques et D'Investissements
    Inventors: Paul B. Queneau, Robert E. Doane, Mark H. Berggren, Mark W. Cooperrider