Abstract: An apparatus and method for the generation of patterns on large optics. A coating layer is deposited on the surface of a large substrate, whereupon a photoresist layer is deposited on the coating layer in relatively small localized areas. A flexible mask is fabricated embodying the pattern to be generated. This flexible mask is then aligned with any desired point on the substrate and brought into contact with the photoresist layer. The photoresist layer is then exposed and each localized area is developed and the underlying coating layer is etched. After the excess photoresist material is washed away the pattern, etched into the coating layer, remains.

Abstract: An apparatus and method for the generation of patterns on large optics. A coating layer is deposited on the surface of a large substrate, whereupon a photoresist layer is deposited on the coating layer in relatively small localized areas. A flexible mask is fabricated embodying the pattern to be generated. This flexible mask is then aligned with any desired point on the substrate and brought into contact with the photoresist layer. The photoresist layer is then exposed and each localized area is developed and the underlying coating layer is etched. After the excess photoresist material is washed away the pattern, etched into the coating layer, remains.

Abstract: An apparatus and method for the generation of patterns on large optics. A coating layer is deposited on the surface of a large substrate, whereupon a photoresist layer is deposited on the coating layer in relatively small localized areas. A flexible mask is fabricated embodying the pattern to be generated. This flexible mask is then aligned with any desired point on the substrate and brought into contact with the photoresist layer. The photoresist layer is then exposed and each localized area is developed and the underlying coating layer is etched. After the excess photoresist material is washed away the pattern, etched into the coating layer, remains.

Abstract: This invention is directed to a new and improved system for determining optical aberrations, such as for example alignment, focus, tilt, astigmatism or coma of a telescope optical system, wherein the telescope optical system is arranged for imaging a random scene and includes a plurality of subapertures, said system comprising a grating disposed at the focal plane of the telescope optical system, an apodizing mask disposed adjacent the grating, said mask having transparent and opaque portions, an array of light detectors, a field lens disposed adjacent the grating for causing the subapertures to be imaged on the array of detectors, apparatus for effecting relative movement between the grating and the other elements, phase detector electronics for receiving the output from the detectors and outputting individual detector signals, and a processor responsive to the detector signals for determining the difference in phase between the individual detector signals and a reference phase, whereby a measure of the aber

Abstract: An achromatic imaging system employs a diffractive hologram as the primary element. A conventional achromatic optical element, comprising either a refractive lens or mirror, is positioned between the primary element and a second holographic optical element. The holographic and conventional elements combine to form an imaging system characterized by high resolution and light weight.