Abstract: Improved poly(vinyl chloride) compositions which exhibit improved adhesivity to improved polyamide compositions which find particular utility in the construction of multi-layer structures, particularly for the fabrication of structures for use in forming electrical insulation structures for wires and cables. In one useful embodiment, the multi-layer structure has in the following order: a layer of PVC and a layer of polyamide in contact with the layer of PVC wherein the layer of PVC includes a vinyl chloride containing copolymer or a terpolymer which exhibits good solubility with the PVC, and which further provides good adhesivity with the polyamide. The polyamide layer comprises an effective amount of an ethylene-bis-tetrabromophthalimide which acts as a fire retardant; the multi-layer structure exhibits good interfacial adhesion and excellent fire retardant characteristics.

Abstract: Improved poly(vinyl chloride) compositions which exhibit improved adhesivity to polyamide which find particular utility in the construction of multi-layer structures, particularly for the fabrication of improved structures for use in forming electrical insulation structures for wires and cables. In one useful embodiment, the multi-layer structure has in the following order: a layer of PVC and a layer of polyamide in contact with the layer of PVC wherein the layer of PVC includes a vinyl chloride containing copolymer or a terpolymer which exhibits good solubility with the PVC, and which further provides good adhesivity with the PA. The vinyl resin is selected from the group consisting of vinyl chloride-vinyl acetate-vinyl alcohol terpolymers.

Abstract: A novel photoresist formulation is provided which provides low striations and excellent wetting properties. The photoresist composition may be applied by spin casting on various substrates used in integrated circuit manufacture. The essential component in this invention is the solvent composition which consists of cyclopentanone (or cyclopentanone-cyclohexanone blend) in combination with an aliphatic alcohol of 5-12 carbon atoms. These solvent components when used in certain specific ratios provide unexpectedly good wetting of various substrates and low striation films.

Abstract: Thermoplastic elastomeric blend of:(A) EPM or EPDM type rubber;(B) amorphous polypropylene homopolymer or copolymer resin; and(C) crystalline polyolefin resin,characterized by improved processability and physical properties.