Abstract: A method of forming a MEMS device provides a wafer having a base with a conductive portion. The wafer also has an intermediate conductive layer. After it provides the wafer, the method adds a diaphragm layer to the wafer. The method removes at least a portion of the intermediate conductive layer to form a cavity between the diaphragm layer and the base. At least a portion of the diaphragm layer is movable relative to the base. After it forms the cavity, the method seals the cavity.

Abstract: A flow sensor has an inlet chamber with a first pressure sensor and an inlet port for receiving fluid, and an outlet chamber with a second pressure sensor and an outlet port. The flow sensor also has an anemometer in fluid communication with at least one of the two chambers.

Abstract: A method of forming a MEMS device provides a wafer having a base with a conductive portion. The wafer also has an intermediate conductive layer. After it provides the wafer, the method adds a diaphragm layer to the wafer. The method removes at least a portion of the intermediate conductive layer to form a cavity between the diaphragm layer and the base. At least a portion of the diaphragm layer is movable relative to the base. After it forms the cavity, the method seals the cavity.

Abstract: A method of forming a MEMS device provides a wafer having a base, a first conductive layer, a second conductive layer, and an intermediate conductive layer. After it provides the wafer, the method removes at least a portion of the intermediate conductive layer to form a cavity between the first and second conductive layers. At least a portion of the first conductive layer is movable relative to the base to form a diaphragm, while the second conductive layer is substantially immovable relative to the base. After it forms the cavity, the method seals the cavity.

Abstract: A flow sensor has an inlet chamber with a first pressure sensor and an inlet port for receiving fluid, and an outlet chamber with a second pressure sensor and an outlet port. The flow sensor also has an anemometer in fluid communication with at least one of the two chambers.

Abstract: A cantilever beam has a proof mass arranged at its distal end so as to cause the beam to resiliently deform into an S-shape when the accelerometer is subjected to acceleration intended to be detected. Strain gauge elements are placed at the two knees of the S-shape.

Abstract: A miniature, solid state, cantilever beam accelerometer is constructed with an arrangement of strain sensing elements which provides for simpler temperature compensation, dual-axis acceleration measurement, and the capability of correcting for nonlinearity in a strain sensing element. Temperature compensation is facilitated by locating two strain sensing elements on the cantilever beam and two on the main body of the accelerometer and connecting the four elements in a Wheatstone bridge. Instead of a single bridge, two half bridges may be formed to allow for independent adjustment of each side of the Wheatstone bridge. Independent adjustment is also possible by using two full bridges with all strain sensing elements oriented in the same direction. If the elements of one bridge are oriented in an orthogonal direction, the accelerometer is capable of measuring both on-axis and off-axis accelerations.