Abstract: A method for preparing pixel data for writing with SLM comprises obtaining (S10) of data representing a pattern. The data is rasterized (S20) to a grid of pixels. The rasterizing comprises assigning (S22) of an edge adjustment value to pixels covering an edge of the pattern. The rasterized pattern is divided (S30) into a number of rasterized pattern planes associated with a respective radiant exposure. The sum of radiant exposures for a completely covered pixel exceeds (S32) a threshold for activating a radiation sensitive layer on a substrate, onto which the pattern is to be printed. The sum of radiant exposures for a pattern edge pixel corresponds (S34) to a quantity sufficient to move a position of where the sum of radiant exposures reaches the activation threshold a distance that corresponds to the edge adjustment value. Data representing the rasterized pattern planes are outputted (S40).

Abstract: Methods, a non-transitory computer-readable storage medium, devices, and a system in relation to training a convolutional neural network for deriving corrected digital pattern descriptions from digital pattern descriptions for use in a process for producing photomasks are disclosed. A reinforcement learning agent is trained to derive corrected digital pattern descriptions from respective digital pattern descriptions. The training is based on a first plurality of generated digital pattern descriptions and an obtained physical model using which predicted binary patterns of photomasks can be derived that would result from inputting digital pattern descriptions to the process for producing photomasks. A second plurality of digital pattern descriptions is then generated, and corresponding corrected digital pattern descriptions are generated using the trained reinforcement learning agent, thereby generating training data.

Abstract: A rasterization method of patterns with periodic components for SLMs is presented, comprising obtaining (S10) of an original pattern, having a periodicity. A first pattern main period is determined (S21). Image area and a first pitch of imaged elements are obtained (S31). The original pattern is scaled (S41) by a first raster scaling factor. The scaled pattern is cropped (S51) to comprise a first integer number of repetitions of the pattern items presenting a periodicity in the first direction that is covered by the image area, giving a rasterized pattern adapted to the intended pattern generator. The rasterized pattern is associated with data representing the first scaling factor. A writing method comprises obtaining of the rasterized pattern. Elements of the SLM in the pattern generator falling outside the rasterized pattern are set to be disabled. The rasterized pattern is written with an optical scaling to a target surface.

Abstract: The present invention refers to a device and method for stereolithograpic three dimensional (3D) printing comprising: a) a container adequate for containing a photopolymerizable polymer, b) at least one laser generator emitting a light beam with a wavelength between 360 nm and 1000 nm, c) modulation means for modulating said light beam into at least two light sheets which are matrices of light, and d) means for irradiating said light sheets in the container containing said photopolymerizable polymer; wherein said at least one laser generator is arranged so that said at least two light sheets are crossed inside said container, leading to polymerization of the photopolymerizable polymer at the crossing of said light sheets.

Abstract: A rasterization method of patterns with periodic components for SLMs is presented, comprising obtaining (S10) of an original pattern, having a periodicity. A first pattern main period is determined (S21). Image area and a first pitch of imaged elements are obtained (S31). The original pattern is scaled (S41) by a first raster scaling factor. The scaled pattern is cropped (S51) to comprise a first integer number of repetitions of the pattern items presenting a periodicity in the first direction that is covered by the image area, giving a rasterized pattern adapted to the intended pattern generator. The rasterized pattern is associated with data representing the first scaling factor. A writing method comprises obtaining of the rasterized pattern. Elements of the SLM in the pattern generator falling outside the rasterized pattern are set to be disabled. The rasterized pattern is written with an optical scaling to a target surface.

Abstract: Methods, a non-transitory computer-readable storage medium, devices, and a system in relation to training a convolutional neural network for deriving corrected digital pattern descriptions from digital pattern descriptions for use in a process for producing photomasks are disclosed. A reinforcement learning agent is trained to derive corrected digital pattern descriptions from respective digital pattern descriptions. The training is based on a first plurality of generated digital pattern descriptions and an obtained physical model using which predicted binary patterns of photomasks can be derived that would result from inputting digital pattern descriptions to the process for producing photomasks. A second plurality of digital pattern descriptions is then generated, and corresponding corrected digital pattern descriptions are generated using the trained reinforcement learning agent, thereby generating training data.

Abstract: A method for manufacturing of a tool for production of synthetic image devices comprises cutting (210) a surface structured plate, giving a respective first and second edge. The plate has geometrical structures—microimages or focusing elements—in a first surface. Cells comprising the geometrical structures have a predetermined period in a first direction. The first edge is brought (212) to face the second edge in a close proximity. The first direction of a first area of the plate adjacent to the first edge is positioned with a predetermined angle with respect to the first direction of a second area of the plate adjacent to the second edge. A relative translation in said same plane between the first edge and the second edge is adapted (214) for bringing a first cell border in the first area to a predetermined distance, relative a corresponding second cell border in the second area. The first and second edges are mutually fixated (216) and mounted (218) onto a cylindrical support.

Abstract: A method for manufacturing of a tool for production of synthetic image devices comprises cutting (210) a surface structured plate, giving a respective first and second edge. The plate has geometrical structures—microimages or focusing elements—in a first surface. Cells comprising the geometrical structures have a predetermined period in a first direction. The first edge is brought (212) to face the second edge in a close proximity. The first direction of a first area of the plate adjacent to the first edge is positioned with a predetermined angle with respect to the first direction of a second area of the plate adjacent to the second edge. A relative translation in said same plane between the first edge and the second edge is adapted (214) for bringing a first cell border in the first area to a predetermined distance, relative a corresponding second cell border in the second area. The first and second edges are mutually fixated (216) and mounted (218) onto a cylindrical support.

Abstract: The present invention provides a method of producing a two-sided microstructured product and a registration structure that can be used for the method. The method comprises the steps of: (800) providing primary product features (80) at a first surface of a substrate sheet (50); (810) providing secondary product features (90) at an opposed surface; (820) registering the mutual alignment of the primary and secondary product features (80, 90) to estimate alignment parameters; and (830) aligning the provision of primary and secondary product features (80, 90). The registration structure comprises a registration-array of focusing elements (20) at a first surface and a registration-array of reference objects (30) at an opposed surface aligned with primary and secondary product features (80,90) that provides a holographic representation (10) of the reference objects (30) in order to estimate the alignment of product features (80,90).

Abstract: The present invention provides a method of producing a two-sided microstructured product and a registration structure that can be used for the method. The method comprises the steps of: (800) providing primary product features (80) at a first surface of a substrate sheet (50); (810) providing secondary product features (90) at an opposed surface; (820) registering the mutual alignment of the primary and secondary product features (80, 90) to estimate alignment parameters; and (830) aligning the provision of primary and secondary product features (80, 90). The registration structure comprises a registration-array of focusing elements (20) at a first surface and a registration-array of reference objects (30) at an opposed surface aligned with primary and secondary product features (80,90) that provides a holographic representation (10) of the reference objects (30) in order to estimate the alignment of product features (80,90).

Abstract: An aspect of the present invention includes a method of lithography to enhance uniformity of critical dimensions of features patterned onto a workpiece. Said workpiece is coated with a coating sensitive to electromagnetic radiation. An electromagnetic radiation source having an illumination intensity is provided. At least one object pixel of electromagnetic radiation is created. A predetermined pattern is exposed, by using said at least one object pixel, on at least a portion of said workpiece in a first exposure pass with a first dose to provide less than full exposure of said coating sensitive to electromagnetic radiation. Said exposing action is repeated at least until said portion of said coating sensitive to electromagnetic radiation is fully exposed, wherein said dose is increased for every following pass. Said fully exposed coating sensitive to electromagnetic radiation is developed.

Abstract: The present invention relates to methods for patterning substrates, such as reticles, masks or wafers, which reduce critical dimension variations, improving CD uniformity. In particular, it relates to tuning doses applied in passes of a multipass writing strategy to measurable characteristics of resists or radiation sensitive layers applied to the substrates. Particular writing strategies are described. Aspects of the present invention are described in the claims, specification and drawings.

Abstract: The present invention relates to methods for patterning substrates, such as reticles, masks or wafers, which reduce critical dimension variations, improving CD uniformity. In particular, it relates to tuning doses applied in passes of a multipass writing strategy to measurable characteristics of resists or radiation sensitive layers applied to the substrates. Particular writing strategies are described. Aspects of the present invention are described in the claims, specification and drawings.

Abstract: An aspect of the present invention includes a method of lithography to enhance uniformity of critical dimensions of features patterned onto a workpiece. Said workpiece is coated with a coating sensitive to electromagnetic radiation. An electromagnetic radiation source having an illumination intensity is provided. At least one object pixel of electromagnetic radiation is created. A predetermined pattern is exposed, by using said at least one object pixel, on at least a portion of said workpiece in a first exposure pass with a first dose to provide less than full exposure of said coating sensitive to electromagnetic radiation. Said exposing action is repeated at least until said portion of said coating sensitive to electromagnetic radiation is fully exposed, wherein said dose is increased for every following pass. Said fully exposed coating sensitive to electromagnetic radiation is developed.