Patents by Inventor Robert F. Blacksmith

Robert F. Blacksmith has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antireflective coating compositions and exposure methods under 200 nm
    Patent number: 6602652
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.
    Type: Grant
    Filed: April 20, 2002
    Date of Patent: August 5, 2003
    Assignee: Shipley Company, L.L.C.
    Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas, III
  • Antireflective coating compositions
    Publication number: 20020172896
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.
    Type: Application
    Filed: April 20, 2002
    Publication date: November 21, 2002
    Applicant: Shipley Company, L.L.C.
    Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas
  • Methods utilizing antireflective coating compositions with exposure under 200 nm
    Patent number: 6410209
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition (ARC), particularly suitable for short wavelength imaging applications such as 193 nm. The ARCs of the invention are preferably used with an overcoated resist layer (i.e. bottom layer ARCs) and in general comprise novel ARC resin binders that can effectively absorb reflected sub-200 nm exposure radiation.
    Type: Grant
    Filed: September 15, 1998
    Date of Patent: June 25, 2002
    Assignee: Shipley Company, L.L.C.
    Inventors: Timothy G. Adams, Edward K. Pavelchek, Roger F. Sinta, Manuel DoCanto, Robert F. Blacksmith, Peter Trefonas, III