Patents by Inventor Robert FICHTL

Robert FICHTL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for machining a workpiece in the production of an optical element
    Patent number: 11980990
    Abstract: A method for the zonal polishing of a workpiece includes using a polishing tool to guide a structured polishing pad over the surface of workpiece to remove material from the workpiece. A structured polishing pad includes a structuring adapted to the movement of a polishing tool.
    Type: Grant
    Filed: March 5, 2020
    Date of Patent: May 14, 2024
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Manfred Matena, Franz-Josef Stickel, Marc Saitner, Robert Fichtl, Hans-Peter Brust
  • METHOD FOR MACHINING A WORKPIECE IN THE PRODUCTION OF AN OPTICAL ELEMENT
    Publication number: 20200198086
    Abstract: A method for the zonal polishing of a workpiece includes using a polishing tool to guide a structured polishing pad over the surface of workpiece to remove material from the workpiece. A structured polishing pad includes a structuring adapted to the movement of a polishing tool.
    Type: Application
    Filed: March 5, 2020
    Publication date: June 25, 2020
    Inventors: Manfred Matena, Franz-Josef Stickel, Marc Saitner, Robert Fichtl, Hans-Peter Brust
  • Method for producing an optical element for an optical system, in particular for a microlithographic projection exposure apparatus
    Patent number: 10146138
    Abstract: A method for producing an optical element includes: providing a substrate (102), applying a layer system (103), wherein an optically effective surface (101) is formed and wherein the layer system has a layer (104) that is thermally deformable for manipulating the geometric shape of the optically effective surface, and applying a temperature field to the optical element while at least regionally heating the thermally deformable layer to above a specified operating temperature of the optical system. The thermally deformable layer is configured such that a deformation that is induced when the temperature field is applied is at least partially maintained after the optical element has cooled. Also disclosed is an optical element (400) that has an optically effective surface (401), a substrate (402), and a layer system (403) that has a reflection layer system (406), which includes a shape-memory alloy.
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: December 4, 2018
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Kerstin Hild, Franz-Josef Stickel, Robert Fichtl, Joachim Hartjes
  • Method For Producing An Optical Element For An Optical System, In Particular For A Microlithographic Projection Exposure Apparatus
    Publication number: 20170315452
    Abstract: A method for producing an optical element includes: providing a substrate (102), applying a layer system (103), wherein an optically effective surface (101) is formed and wherein the layer system has a layer (104) that is thermally deformable for manipulating the geometric shape of the optically effective surface, and applying a temperature field to the optical element while at least regionally heating the thermally deformable layer to above a specified operating temperature of the optical system. The thermally deformable layer is configured such that a deformation that is induced when the temperature field is applied is at least partially maintained after the optical element has cooled. Also disclosed is an optical element (400) that has an optically effective surface (401), a substrate (402), and a layer system (403) that has a reflection layer system (406), which includes a shape-memory alloy.
    Type: Application
    Filed: July 13, 2017
    Publication date: November 2, 2017
    Inventors: Kerstin HILD, Franz-Josef STICKEL, Robert FICHTL, Joachim HARTJES