Abstract: A method and apparatus for thermal processing a photosensitive element includes heating a composition layer on a flexible substrate to a melt temperature of an unirradiated area of the composition layer and maintaining the flexible substrate at a temperature below the melt temperature while pressing a heated absorbent layer against the heated composition layer, and repeating these steps for multiple cycles. A further embodiment of the method includes a step of cooling the flexible substrate and layer laminate on each cycle to maintain the flexible substrate at the desired temperature below that of the heated composition layer.

Abstract: A process of anodically coupling compounds of the formula R.sup.1.sub.f R.sup.2.sub.f CFI where R.sup.1.sub.f and R.sup.2.sub.f are each independently fluorine or a perfluoroalkyl radical containing from 4 to 40 carbon atoms in a liquid carboxylic acid in the presence of a small amount of carboxylate ion. The process generally is carried out at from 25.degree. to 150.degree. C. Generally the concentration of R.sup.1.sub.f R.sup.2.sub.f CFI is from 5 to 40 weight percent of the reaction mixture.