Patents by Inventor Robert Franken

Robert Franken has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier
    Patent number: 8208118
    Abstract: Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.
    Type: Grant
    Filed: February 6, 2009
    Date of Patent: June 26, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: David Warren Burry, Ralph Brinkhof, Frank Staals, Robert Franken, Erik Johan Koop
  • Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system
    Patent number: 7869022
    Abstract: A scatterometer has a focus sensor arranged to detect whether the target being measured is in a correct focal plane. A modulation is applied to a component of the focus sensor or the scatterometer such that a defocus as measured by the focus sensor varies according to a certain function. From knowledge of the modulation, the gain of the sensor can be calibrated.
    Type: Grant
    Filed: July 18, 2007
    Date of Patent: January 11, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Johan Maria Van Boxmeer, Henricus Petrus Maria Pellemans, Robert Franken
  • Method for Determining Exposure Settings, Lithographic Exposure Apparatus, Computer Program and Data Carrier
    Publication number: 20090201473
    Abstract: Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at least one measurement position relative to the position of the exposure field in the second and third direction.
    Type: Application
    Filed: February 6, 2009
    Publication date: August 13, 2009
    Applicant: ASML Netherlands B.V.
    Inventors: David Warren BURRY, Ralph BRINKHOF, Frank STAALS, Robert FRANKEN, Erik Johan KOOP
  • Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system
    Publication number: 20090021708
    Abstract: A scatterometer has a focus sensor arranged to detect whether the target being measured is in a correct focal plane. A modulation is applied to a component of the focus sensor or the scatterometer such that a defocus as measured by the focus sensor varies according to a certain function. From knowledge of the modulation, the gain of the sensor can be calibrated.
    Type: Application
    Filed: July 18, 2007
    Publication date: January 22, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Johan Maria Van Boxmeer, Henricus Petrus Maria Pellemans, Robert Franken