Abstract: A method for making a chrome photo-mask is disclosed. A photo-mask blank is activated with activator on its upper surface for electroless chrome plating Next, the activated photo-mask blank is then immersed in the electroless chrome plating solution for being coated with a thin chrome layer. The electroless chrome plating process will continue until a desired thickness is formed. Preferably, an electro-plating process is employed after the growth of an initial electroless chrome layer. Then, the photo-mask blank with the chrome layer is subject to oxidation for forming an antireflection layer on the chrome layer. After the antireflective layer is successively formed, a resist film is formed on the antireflective layer. The resist film is then patterned in accordance with the predetermined pattern. Next, the antireflective layer and the chromium layer are dry-etched or wet-etched through openings in the patterned resist film. The resist film is subsequently stripped to form the desired photo-mask.