Abstract: A sputtering target assembly for a sputter coating apparatus includes a spacing ring which is threaded to a target holder and a target which attaches to the spacing ring at one side and fits into the target holder at another side. The target holder fits into a cathode body which functions as a magnetic pole piece, a portion of a cooling system, and a mechanical stabilizer for the target. The target holder also provides cooling, using cooling passages and the spacing means which is threaded to the target holder. The sputtering target has an arch-like face which promotes a controlled plastic deformation in a preselected direction, so that heating expansion during operation results in the target being urged into forceful and close contact with at least two cooled surfaces.

Abstract: Described is a method of manufacturing a sputtering target assembly is that minimizes distortion during manufacture and a novel target assembly so produced. The method involves positioning a backing member in an external shoulder formed in the target member, electron beam welding mating surfaces and machining the interior surface of the welded assembly to provide a coextensive surface along the inner surfaces of the target and backing members. The resulting target assembly can withstand high water pressure and high sputter power levels.