Patents by Inventor Robert G. Heumann

Robert G. Heumann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High resolution photoresist compositions
    Publication number: 20030003391
    Abstract: The invention provides photoresists and resist preparative methods. Methods of the invention include treatment of a resist resin with methylene chloride or other organic solvent to remove low molecular weight materials. It has been found that the treated resin can be formulated into resists that provide manufactured electronic devices with significantly reduced defects.
    Type: Application
    Filed: February 8, 2001
    Publication date: January 2, 2003
    Applicant: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Robert G. Heumann, Edward W. Rutter, Jung-Kuang R. Chen, Margaret C. Lawson, George M. Jordhamo, Timothy M. Hughes, Wayne M. Moreau, Ann Marie Mewherter