Patents by Inventor Robert G Long

Robert G Long has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6903017
    Abstract: An integrated circuit metallization structure using a titanium/aluminum alloy, and a method to generate such a structure, provide reduced leakage current by allowing mobile impurities such as water, oxygen, and hydrogen to passivate structural defects in the silicon layer of the IC. The titanium layer of the structure is at least partially alloyed with the aluminum layer, thereby restricting the ability of the titanium to getter the mobile impurities within the various layers of the IC. Despite the alloying of the titanium and aluminum, the metallization structure exhibits the superior contact resistance and electromigration properties associated with titanium.
    Type: Grant
    Filed: August 26, 2003
    Date of Patent: June 7, 2005
    Assignee: Agilent Technologies, Inc.
    Inventors: Ricky D. Snyder, Robert G Long, David W Hula, Mark D. Crook
  • Patent number: 6646346
    Abstract: An integrated circuit metallization structure using a titanium/aluminum alloy, and a method to generate such a structure, provide reduced leakage current by allowing mobile impurities such as water, oxygen, and hydrogen to passivate structural defects in the silicon layer of the IC. The titanium layer of the structure is at least partially alloyed with the aluminum layer, thereby restricting the ability of the titanium to getter the mobile impurities within the various layers of the IC. Despite the alloying of the titanium and aluminum, the metallization structure exhibits the superior contact resistance and electromigration properties associated with titanium.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: November 11, 2003
    Assignee: Agilent Technologies, Inc.
    Inventors: Ricky D. Snyder, Robert G Long, David W Hula, Mark D. Crook