Abstract: An overhead storage device or system may include a mechanism for hoisting the object to be stored (e.g., a bicycle) at an elevated height (e.g., above grade or floor level). In general, the present teachings may include a cable pulley engaged with a constant torque spring unit structurally configured to apply an approximately constant torque to the cable spool that promotes rotation of a spool thereof for winding of a lift cable about the spool to lift a load. Also disclosed are techniques for improving such a constant toque lifting unit such as an inertial brake structurally configured to slow down or stop an undesired, accelerated winding of a lift cable, a self-coiling device structurally configured to advantageously wind the lift cable a predetermined amount (e.g., for removal of same as a hinderance), and an attachment mechanism structurally configured to securely couple to a load.

Abstract: An overhead storage device or system may include a mechanism for hoisting the object to be stored (e.g., a bicycle) at an elevated height (e.g., above grade or floor level). In general, the present teachings may include a cable pulley engaged with a constant torque spring unit structurally configured to apply an approximately constant torque to the cable spool that promotes rotation of a spool thereof for winding of a lift cable about the spool to lift a load. Also disclosed are techniques for improving such a constant toque lifting unit such as an inertial brake structurally configured to slow down or stop an undesired, accelerated winding of a lift cable, a self-coiling device structurally configured to advantageously wind the lift cable a predetermined amount (e.g., for removal of same as a hinderance), and an attachment mechanism structurally configured to securely couple to a load.

Abstract: A grating based line narrowing unit for gas discharge lasers with increased beam expansion to produce smaller bandwidths. The grating has a grating surface larger than 100 cm2 and is a replica grating produced from a master grating produced with a lithography process on a single crystal substrate. In preferred embodiments, a beam from the chamber of the laser is expanded with four prism beam expanders. The large grating, much larger than gratings historically produced from diamond lined gratings, permit substantial reductions in bandwidth while maintaining laser efficiency. A narrow band of wavelengths in the expanded beam is reflected from a grating in a Littrow configuration back via the bi-directional beam expanders into the laser chamber for amplification.

Abstract: A portable laser beam monitor utilizes a plurality of optical trains to monitor ultraviolet laser beam profiles at a plurality of positions along a laser beam path. A preferred embodiment useful for monitoring beam profiles of lithography lasers measures the beam profile at the front aperture, the rear aperture, the shutter plane and at infinity (the divergence plane). The beam profiles are imaged on a fluorescent screen which is monitored by a visible light camera. Images of the profiles may be discharged on the screen of a lap top computer.

Abstract: Large, high quality diffraction gratings having carefully formed blazing angles and defect free reflective surfaces can be fabricated on specially oriented substrates using photolithographic or micromachining techniques. By selecting a single crystal substrate whose surface is at a known angle with respect to certain crystallographic planes of the substrate, anisotropic etching of the substrate can achieve diffraction grating grooves with reflective surfaces corresponding to the to specific crystallographic planes. The angle between the surface of the substrate and the specific crystallographic planes determines the blazing angle of the diffraction grating. Thus, large, high quality diffraction gratings can be fabricated for use in, for example, laser systems, or for use as master gratings in the manufacture of replica gratings.

Abstract: A laser lithography system in which two or more lasers provide laser illumination for two or more lithography exposure tools through a laser beam multiplexer. The mulitplexer contain several mirror devices each having a multi-reflectance mirror with surfaces of different reflectance and an adjusting mechanism for positioning one of the surfaces to intersect a laser beam from at least one of the lasers and direct a portion of it to at least one of the exposure tools.

Abstract: The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control.

Abstract: A system for providing support for the movement of a laser chamber of a laser system during the installation and removal of the laser chamber from the laser system housing. The system includes a rail assembly that is retractable and extendible from the laser system housing and provides support for moving the laser chamber between an operating position within the housing and a position outside of the housing for removal. The rail assembly is retractable to reside within the housing when not in use. The system may also include at least one actuator for controlling the movement of the laser chamber in a direction having a vertical component. Actuator types that may be used include rotary, piston cylinder, hydraulic, pneumatic, and/or electrical mechanical. One type of rail assembly includes opposing rail structures that retract and extend by moving laterally out from the housing or by pivoting out from the housing. The system may be implemented with a gas laser system such as an excimer laser system.

Abstract: A laser-illuminated wafer-exposing system such as a stepper or scanner having a first light intensity detector located within the exposing system near a mask and second light intensity detector located near the output of the laser. A feedback control system controls the output of the laser based on signals detected by at least one of the detectors. The feedback control system includes a processor programmed with an algorithm which is used to control the laser discharge voltage in order to provide light pulses having desired intensity at the mask with the laser operating in a burst mode. The algorithm utilizes at least the following parameters; a previously measured pulse energy, a calculated energy error, a calculated dose error, a value for the rate of change of pulse energy with voltage, and at least one reference voltage.

Abstract: A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.

Abstract: A laser chamber has angled reflectors that reflect acoustic and shock waves away from the laser discharge area to minimize acoustic and shock wave disturbances. The angled reflector may have different configurations to assist in the dissipation of the acoustic and shock waves. For example, the angled reflector may have a modulated reflective surface, such as having grooves or holes defined within the surface. Further, the angled reflector may have a reflective surface with acoustic and shock wave absorbing properties. The reflective surface with absorbent properties may be a felt metal or have multiple layered porous surfaces. In addition, the walls of the laser chamber may be modulated to assist in the dissipation of the acoustic waves and shock waves through absorption, scattering, and by generating interference within the reflected waves. Multiple layered porous surfaces may be used along the walls to absorb and scatter incident waves.

Abstract: An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber, a process chamber including an elevator, and a cool down chamber, each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. The process chamber includes non-metallic media such that it can be operated in oxidation systems so that corrosive acids will not affect the process chamber operation.

Abstract: An apparatus is provided for loading and/or unloading wafers from a holding cassette to a quartz boat without scraping the wafer on the slots contained in the quartz boat; the apparatus comprising a robot and a paddle. The improvement resides in the main feature of wafer sensor means disposed on the surface of the paddle, the wafer sensor means being connected to a microprocessor which converts and digitizes an analog signal from the wafer sensor means, the analog signal indicating the position of a wafer disposed on the surface of the paddle. Further included is an arrangement for signaling the robot to compensate for the particular position of the wafer on the paddle by adjusting the position of the paddle with respect to the quartz boat.

Abstract: Two methods for determination of thickness of a film of known material that is mounted on one face of a solid substrate of known material are disclosed, using: (1) inversion of an optical beam reflectivity equation; or (2) determination of the film thickness that minimizes the variance of the optical beam reflectivity, computed at each of a predetermined sequence of optical beam wavelengths. Four methods for determination of the (real) refractive index of a film of known thickness mounted on a face of a solid substrate of known material are disclosed, using: (1) minimization of absolute differences of computed and measured optical beam reflectivity, summed over a sequence of known film thicknesses, for assumed values of the refractive index; (2 and 3) two iterative techniques of promote convergence of an estimate of the index to a final value of the refractive index; or (4) solution of a quadratic equation whose coefficients are slowly varying functions of the solution variable.

Abstract: Several methods for evaluating certain changes induced in a film of semiconductor resist material after the coat process and before or at completion of the softbake process, by monitoring thickness of and absorption by a film of resist material.

Abstract: Two methods of determination of the chemical changes induced in a film of material such as photoresist that has been exposed to electromagnetic radiation. Two methods use measurement of polarized light reflected by the film mounted on a substrate to determine a real refractive index or a complex refractive index of the film. Two other methods use measurement of polarized light by the film mounted on a (partly) transparent substrate to determine a real refractive index or a complex refractive index of the film.

Abstract: Improved closed-loop pyrochemical processes for the decomposition of water in which at least one of the reaction steps in each process is carried out pyrochemically within the central reaction chamber of a thermonuclear reactor during and immediately after a thermonuclear reaction, and in which one of the reagents in or products of the chamber reaction is a metal having a boiling temperature which is higher than the decomposition temperature of the associated metal oxide. The product of the pyrochemical reaction which includes the metal element is in the condensed phase after completion of the reaction and may thus be easily separated from the remaining gaseous reaction products.