Patents by Inventor Robert Glosser

Robert Glosser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6992441
    Abstract: A photocathode manufacturing intermediary article (24) includes a substrate layer (26), and an active layer (20) that is carried by the substrate layer (26). The active layer (20) includes photoemissive alkali antimonide material that is epitaxially grown on the substrate (26).
    Type: Grant
    Filed: September 13, 2004
    Date of Patent: January 31, 2006
    Assignee: Litton Systems, Inc.
    Inventors: Robert Glosser, Joseph P. Estrera, Loig E. Bourree
  • Publication number: 20050104517
    Abstract: A photocathode manufacturing intermediary article (24) includes a substrate layer (26), and an active layer (20) that is carried by the substrate layer (26). The active layer (20) includes photoemissive alkali antimonide material that is epitaxially grown on the substrate (26).
    Type: Application
    Filed: September 13, 2004
    Publication date: May 19, 2005
    Applicant: LITTON SYSTEMS, INC.
    Inventors: Robert GLOSSER, Joseph ESTRERA, Loig BOURREE
  • Patent number: 4953983
    Abstract: An apparatus and method for non-destructive measuring of local carrier concentration and bandgap in a semiconductor such as gallium arsenide or gallium aluminum arsenide. A high energy source of photons, e.g. a laser, photo injects carriers on the surface of the semiconductor causing a change in the semiconductor's surface photo reflectance. The fractional change in photo reflectance is measured for a plurality of the photon energies sufficient to identify several Franz-Keldysh peaks, and the photon energies corresponding to these peaks. This information is used to infer the local electric field strength and carrier concentration of the semiconductor as well as semiconductor's bandgap. By noting variations in these parameters throughout the bulk semiconductor, one can identify fatal fabrication flaws in the semiconductor crystal before time and money is expended to fabricate complicated semiconductor architectures in the crystal.
    Type: Grant
    Filed: March 25, 1988
    Date of Patent: September 4, 1990
    Inventors: Nicholas Bottka, D. Kurt Gaskill, Robert Glosser