Abstract: The present invention in some embodiments provides sputter deposition techniques for applying thin film and thereafter applying over the sputtered film a temporary protective film. The thin film can optionally be applied by sputtering a target in a gaseous sputtering atmosphere containing an oxidizing gas and/or an inert gas. The invention in some embodiments relates to an insulating glazing unit or a monolithic pane having a thin film coating, deposited for example by sputtering, on at least one major surface, the thin film coating carrying a temporary protective film. The invention also provides embodiments involving high efficiency methods for producing such products.