Patents by Inventor Robert-Han Munnig Schmidt
Robert-Han Munnig Schmidt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9696633Abstract: A substrate handling apparatus for handling a substrate is disclosed. The substrate handling apparatus includes a substrate feeding device to feed the substrate towards an exposure area, a substrate receiving device to receive the substrate from the exposure area, and a substrate stabilization device to maintain, at least in the exposure area, the substrate substantially flat at an exposure height and/or tilt, the substrate stabilization device configured for contactless stabilization of the flexible substrate.Type: GrantFiled: March 14, 2011Date of Patent: July 4, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Johannes Onvlee, Robert-Han Munnig Schmidt
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Publication number: 20150314968Abstract: An apparatus for carrying and transporting a product, comprising a conveyor having a surface, which surface is during use directed towards the product and is provided with inlet openings and outlet openings for a medium for supporting and providing the product with traction, wherein the surface is divided into adjacent surface parts, and wherein the inlet openings and outlet openings are provided in the vicinity of the surface parts, and said adjacent surface parts are adjustable in height and/or form and/or shape so as to control the flow of the medium from the inlet openings to the outlet openings.Type: ApplicationFiled: May 1, 2015Publication date: November 5, 2015Inventors: Ronald Adrianus Johannes Van Ostayen, Robert Han Munnig Schmidt, Vuong Hong Phuc
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Patent number: 8755030Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.Type: GrantFiled: March 9, 2011Date of Patent: June 17, 2014Assignee: ASML Netherlands B.V.Inventors: Christiaan Louis Valentin, Antonius Franciscus Johannes De Groot, Robert-Han Munnig Schmidt, Johannes Petrus Martinus Bernardus Vermeulen, Bartholomeus Catharina Thomas Van Bree
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Patent number: 8368868Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.Type: GrantFiled: November 30, 2009Date of Patent: February 5, 2013Assignee: ASML Netherlands B.V.Inventors: Johannes Petrus Martinus Bernardus Vermeulen, Marcel Koenraad Marie Baggen, Hans Butler, Henrikus Herman Marie Cox, Jan Van Eijk, Andre Bernardus Jeunink, Nicolaas Rudolf Kemper, Robert-Han Munnig Schmidt, Engelbertus Antonius Fransiscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Theodorus Petrus Maria Cadee, Fransiscus Mathijs Jacobs, Christiaan Louis Valentin
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Publication number: 20130021593Abstract: A substrate handling apparatus for handling a substrate is disclosed. The substrate handling apparatus includes a substrate feeding device to feed the substrate towards an exposure area, a substrate receiving device to receive the substrate from the exposure area, and a substrate stabilization device to maintain, at least in the exposure area, the substrate substantially flat at an exposure height and/or tilt, the substrate stabilization device configured for contactless stabilization of the flexible substrate.Type: ApplicationFiled: March 14, 2011Publication date: January 24, 2013Applicant: ASML Netherlands B.V.Inventors: Johannes Onvlee, Robert-Han Munnig Schmidt
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Patent number: 8259289Abstract: In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.Type: GrantFiled: June 29, 2009Date of Patent: September 4, 2012Assignee: ASML Netherlands B.V.Inventors: Johannes Catharinus Hubertus Mulkens, Robert-Han Munnig Schmidt
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Publication number: 20110222039Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.Type: ApplicationFiled: March 9, 2011Publication date: September 15, 2011Applicant: ASML Netherlands B.V.Inventors: Christiaan Louis VALENTIN, Antonius Franciscus Johannes DE GROOT, Robert-Han MUNNIG SCHMIDT, Johannes Petrus Martinus Bernardus VERMEULEN, Bartholomeus Catharina Thomas VAN BREE
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Publication number: 20100159399Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.Type: ApplicationFiled: November 30, 2009Publication date: June 24, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Petrus Martinus Bernardus VERMEULEN, Marcel Koenraad Marie Baggen, Hans Butler, Henrikus Herman Marie Cox, Jan Van Eijk, Andre Bernardus Jeunink, Nicolaas Rudolf Kemper, Robert-Han Munnig Schmidt, Engelbertus Antonius Fransiscus Van Der Pasch, Marc Wilhelmus Maria Van Der Wijst, Theodorus Petrus Maria Cadee, Fransiscus Mathijs Jacobs, Christiaan Louis Valentin
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Patent number: 7728955Abstract: A system for controlling the radiation dose in a pulse of radiation having a relatively large dose, in which a pulsed beam of radiation is divided into a plurality of pulsed sub-beams of radiation and the radiation dose of the pulses is adjusted after the radiation beam has been divided.Type: GrantFiled: March 21, 2006Date of Patent: June 1, 2010Assignee: ASML Netherlands B.V.Inventor: Robert-Han Munnig Schmidt
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Patent number: 7714305Abstract: Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.Type: GrantFiled: March 9, 2006Date of Patent: May 11, 2010Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Huibert Visser, David William Callan, Robert-Han Munnig Schmidt, George Howard Robbins
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Patent number: 7679720Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.Type: GrantFiled: February 1, 2008Date of Patent: March 16, 2010Assignee: ASML Netherlands B.V.Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig-Schmidt, Harmen Klaas Van der Schoot, Rob Jansen
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Patent number: 7612867Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.Type: GrantFiled: August 11, 2008Date of Patent: November 3, 2009Assignee: ASML Netherlands B.V.Inventors: Gerard Van Schothorst, Fransiscus Hendrikus Van Deuren, Jan Van Eijk, Erik Roelof Loopstra, Robert-Han Munnig Schmidt, Felix Godfried Peter Peeters
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Publication number: 20090263734Abstract: In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.Type: ApplicationFiled: June 29, 2009Publication date: October 22, 2009Applicant: ASML Netherlands B.V.Inventors: Johannes Catharinus Hubertus MULKENS, Robert-Han Munnig Schmidt
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Patent number: 7567338Abstract: In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.Type: GrantFiled: August 30, 2006Date of Patent: July 28, 2009Assignee: ASML Netherlands B.V.Inventors: Johannes Catharinus Hubertus Mulkens, Robert-Han Munnig Schmidt
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Publication number: 20090002676Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.Type: ApplicationFiled: August 11, 2008Publication date: January 1, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Gerard Van Schothorst, Fransiscus Hendrikus Van Deuren, Jan Van Eijk, Erik Roelof Loopstra, Robert-Han Munnig Schmidt, Felix Godfried Peter Peeters
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Patent number: 7423730Abstract: A lithographic apparatus including means for selectively transmitting a projection beam before imaging the patterned projection beam onto a substrate. The means may include any of the following: a selectively transmitting device disposed downstream of a patterning device in the direction of the projection beam, a fixed and a moving set of masking blades in a scanning system or an array of switchable elements. The means may be provided to a mask table/holder or to a frame or structure of the lithographic projection apparatus.Type: GrantFiled: May 19, 2004Date of Patent: September 9, 2008Assignee: ASML Netherlands B.V.Inventors: Gerard Van Schothorst, Fransiscus Hendrikus Van Deuren, Jan Van Eijk, Erik Roelof Loopstra, Robert-Han Munnig Schmidt, Felix Godfried Peter Peeters
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Publication number: 20080174750Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.Type: ApplicationFiled: February 1, 2008Publication date: July 24, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig-Schmidt, Harmen Klaas Van Der Schoot, Rob Jansen
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Patent number: 7391499Abstract: A lithographic apparatus for reducing the visibility of artifacts in the pattern is provided. The apparatus comprises an illumination system, a patterning device, a projecting system, and a modulating device. The illumination system supplies a beam of radiation. The patterning device patterns the beam. The projection system projects the beam onto a target portion of a substrate. The modulating device modulates the beam to impart the pattern with a modulation scheme.Type: GrantFiled: December 2, 2004Date of Patent: June 24, 2008Assignee: ASML Netherlands B.V.Inventor: Robert-Han Munnig Schmidt
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Patent number: 7359032Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.Type: GrantFiled: August 25, 2004Date of Patent: April 15, 2008Assignee: ASML Netherlands B.V.Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig Schmidt, Harmen Klaas Van Der Schoot, Rob Jansen
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Patent number: 7342644Abstract: A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.Type: GrantFiled: December 29, 2004Date of Patent: March 11, 2008Assignee: ASML Netherlands B.V.Inventors: Johannes Jacobus Matheus Baselmans, Anastasius Jacobus Anicetus Bruinsma, Pieter Willem Herman De Jager, Robert-Han Munnig Schmidt, Henri Johannes Petrus Vink