Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.

Abstract: The present invention discloses microcapsules that are stable in acidic aqueous systems. The microcapsules may be utilized to protect a hydrophobic substance. The microcapsules may be utilized in acidic food products. The microcapsule include at least one hydrophobic substance and a layer around the at least one hydrophobic substance. The layer includes polysaccharide glycated protein. Methods for producing the microcapsules are also disclosed here.

Abstract: The present invention discloses microcapsules that are stable in acidic aqueous systems. The microcapsules may be utilized to protect a hydrophobic substance. The microcapsules may be utilized in acidic food products. The microcapsule includes at least one hydrophobic substance and a layer around the at least one hydrophobic substance. The layer includes protein aggregates and a negatively charged polymer having blockwise charges, such as pectin. Methods for producing the microcapsules are also disclosed here.

Abstract: A device for refreshing fabrics by reducing malodors and/or wrinkles without requiring that the fabrics to be put through an entire standard laundry process. The device comprises an extractable drawer which is pulled out of the device to allow for loading of a fabric into a receiving region. The extractable drawer can then be closed transporting the fabric into the interior of the device. A fabric treatment composition is sprayed or otherwise dispensed onto the fabrics when the device is operated. The device comprises an air flow path and a heating element which allows for the fabrics to be treated during use and comprises a passive heat management system within the shell to minimize formation of hot spots and direct air flow away from the side walls. The extractable drawer of the present invention can be positioned to extract laterally or vertically out of the shell of the device.

Abstract: A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.

Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

Abstract: A substrate handling apparatus for handling a substrate is disclosed. The substrate handling apparatus includes a substrate feeding device to feed the substrate towards an exposure area, a substrate receiving device to receive the substrate from the exposure area, and a substrate stabilization device to maintain, at least in the exposure area, the substrate substantially flat at an exposure height and/or tilt, the substrate stabilization device configured for contactless stabilization of the flexible substrate.

Abstract: In optical maskless lithography, scanning of a single substrate is typically much slower than in conventional lithography. Solutions are described for the adoption of immersion lithography techniques into optical maskless lithography and in particular provides one or more solutions to reduce the amount of time which the immersion liquid is in contact with any given part of the top surface of the substrate during imaging.

Abstract: The disclosure relates to the field of molecular recognition or detection of discontinuous or conformational binding sites or epitopes corresponding to a binding molecule, in particular, in relation to protein-protein, protein-nucleic acid, nucleic acid-nucleic acid or biomolecule-ligand interactions. Provided is a synthetic molecular library allowing testing for, identification, characterization, or detection of a discontinuous binding site able to interact with a binding molecule, the library having been provided with a plurality of test entities, each test entity comprising at least one first segment spotted next to a second segment, each segment having the capacity of being a potential single part of a discontinuous binding site.

Abstract: The present invention relates to a composition comprising thermoplastic materials and crosslinked microgels which are not crosslinked by high-energy radiation, processes for its preparation, its use for the production of thermoplastically processable shaped articles and shaped articles produced from the composition.

Abstract: A system for reducing compressor noise includes a rotor having a plurality of blades. The blades have a nominal geometry characterized by a blade parameter. At least some of the blades are mistuned, such that they differ from the nominal geometry by greater than a manufacturing tolerance in the blade parameter. The blades produce shock waves at a blade passing frequency, and the mistuned blades shift acoustic energy away from the blade passing frequency to multiple lower amplitude tones at other frequencies. The system is configurable to be deployed with an inlet silencer that preferentially absorbs acoustic energy at some of the shifted frequencies.

Abstract: The present invention relates generally to the field of fluorescent dyes as a system useful for surgery imaging. More particularly, the present invention relates to systems, methods and kits for exciting fluorescent, phosphorescent or luminescent molecules with light from a light source and detecting the relative fluorescent, phosphorescent, or luminescent light intensity emitted from the fluorescent, phosphorescent, or luminescent molecule. Such systems may be applied as mapping agents for various surgical techniques, such as for cancer surgeries and biopsies.

Abstract: The present invention relates to a condiment comprising an emulsion of an aqueous phase and an oil or fat phase, the emulsion comprising a potato protein protease inhibitor isolate. The invention further relates to a method for preparing a condiment according to any of the preceding claims, comprising preparing an aqueous phase comprising the protein protease inhibitor isolate and thereafter dispersing the oil or fat phase in the aqueous phase or dispersing the aqueous phase in the oil or fat phase.

Abstract: The invention relates to polyamide-elastomer mixtures with an improved hydrolysis resistance. In this case, the elastomer is present in particular in the form of a microgel. The polyamide-elastomer mixtures according to the invention can be processed into molded articles that are used, for example, in the automobile industry, in particular as media-conducting conduits.

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.

Abstract: A device for refreshing fabrics by reducing malodors and/or wrinkles without requiring that the fabrics to be put through an entire standard laundry process. The device comprises an extractable drawer which is pulled out of the device to allow for loading of a fabric into a receiving region. The extractable drawer can then be closed transporting the fabric into the interior of the device. A fabric treatment composition is sprayed or otherwise dispensed onto the fabrics when the device is operated. The device comprises an air flow path and a heating element which allows for the fabrics to be treated during use and comprises a passive heat management system within the shell to minimize formation of hot spots and direct air flow away from the side walls. The extractable drawer of the present invention can be positioned to extract laterally or vertically out of the shell of the device.

Abstract: A fabric treating system comprises an enclosure comprising a first wall, a second wall, and a fabric receiving space defined by the enclosure. The fabric treating system also comprises a support member positioned proximate to the first wall. The support member is configured to support one of a hanger configured to support a piece of fabric and the piece of fabric within the fabric receiving space. The fabric treating system also comprises a fabric tensioning system positioned at least on the second wall. The fabric tensioning system comprises at least a first fabric grasper configured to be attached to at least a first portion of the piece of fabric to apply tension to the piece of fabric.

Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

Abstract: A system for controlling the radiation dose in a pulse of radiation having a relatively large dose, in which a pulsed beam of radiation is divided into a plurality of pulsed sub-beams of radiation and the radiation dose of the pulses is adjusted after the radiation beam has been divided.

Abstract: Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing a pivotable mirror configured to move a patterned radiation beam incident on the substrate in substantial synchronism with the substrate.