Patents by Inventor Robert Harrison Macklin

Robert Harrison Macklin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of improving x-ray lithography in the sub 100nm range to create high quality semiconductor devices
    Patent number: 6845145
    Abstract: The present invention is directed to the production of high quality semi-conductor devices created at speeds and in sizes that far exceed current x-ray lithography capabilities.
    Type: Grant
    Filed: June 7, 2001
    Date of Patent: January 18, 2005
    Assignee: SAL, Inc.
    Inventors: Robert Allen Selzer, Franz Ludwig Rauch, Heinz Siegert, Klaus Simon, William Rudolf Friml, Joe Baker Gagnon, Robert Harrison Macklin
  • Method of improving x-ray lithography in the sub 100nm range to create high quality semiconductor devices
    Publication number: 20010026606
    Abstract: The present invention is directed to the production of high quality semi-conductor devices created at speeds and in sizes that far exceed current x-ray lithography capabilities.
    Type: Application
    Filed: June 7, 2001
    Publication date: October 4, 2001
    Inventors: Franz Ludwig Rauch, Heinz Siegert, Klaus Simon, William Rudolf Friml, Joe Baker Gagnon, Robert Harrison Macklin
  • Method of improving x-ray lithography in the sub 100nm range to create high quality semiconductor devices
    Patent number: 6295332
    Abstract: The present invention is directed to the production of high quality semi-conductor devices created at speeds and in sizes that far exceed current x-ray lithography capabilities.
    Type: Grant
    Filed: June 12, 1999
    Date of Patent: September 25, 2001
    Inventors: Robert Allen Selzer, William Rudolf Friml, Joe Baker Gagnon, Robert Harrison Macklin, Franz Ludwig Rauch, Heinz Siegert, Klaus Simon