Abstract: Described is a method performed by a computing device, the method comprises: deriving a hierarchal structure of hardware instances of a hardware block, wherein the hardware block is described in a register transfer language (RTL); determining complexity of at least one hardware instance, in the hierarchal structure, with reference to a complexity metric; identifying, in response to the determined complexity of the at least one hardware instance, whether the at least one hardware instance is to be modeled; and modifying the hierarchal structure with information about the to be modeled hardware instance.

Abstract: Described is a method performed by a computing device, the method comprises: deriving a hierarchal structure of hardware instances of a hardware block, wherein the hardware block is described in a register transfer language (RTL); determining complexity of at least one hardware instance, in the hierarchal structure, with reference to a complexity metric; identifying, in response to the determined complexity of the at least one hardware instance, whether the at least one hardware instance is to be modeled; and modifying the hierarchal structure with information about the to be modeled hardware instance.

Abstract: An assembly is provided for purifying toxic gases from production processes by thermal conversion in a reactor chamber and subsequent treatment of reaction products with a sorption agent in a washing device in order to bind water-soluble reaction products and to elute solid reaction products. The reactor chamber has an external wall and an internal wall, the internal wall tapering at its base in the form of a funnel at a predetermined angle. A unit for thermal treatment of toxic gases is located on the reactor chamber, sealing the top of the chamber. An inner face of the internal wall of the reactor chamber comprises a film of water flowing downwards in a uniform manner. The exterior of the internal wall is surrounded by a cloak of water. A waste gas outlet and a connection for a water circuit are located at the lower end of the tapering internal wall.