Abstract: A method and apparatus for determining the state of the lens transmittance of an optical projection system are described. A lens or imaging objective transmission is determined as a function of exit pupil transverse direction cosine (nx,ny) at multiple field points thereby providing a more complete analysis and correction of a photolithographic exposure system. The entrance pupil of a projection imaging system is uniformly illuminated and the angular dependence of transmission through the imaging system as a function of exit pupil direction cosines is determined. The illumination source includes a light conditioner with an in-situ illumination structure (ISIS), which is an optical structure that can provide uniform illumination of the system's entrance pupil.

Abstract: Techniques for producing emulations of lithographic tools and processes using virtual wafers and lithographic libraries are described. Emulating a lithographic projection imaging machine includes determining characteristics of the imaging machine, of a reticle used in the imaging machine, and of layer specific processes. Then performing emulation on a virtual wafer using the characteristics of the imaging machine, reticle, and layer specific processes. The machine characteristics determined include characteristics of an exposure source, lens aberration, exit pupil, mechanics, vibration, calibration offsets, or resist. The reticle characteristics determined include distortion, critical dimension, phase transmission error, mask clips, as drawn specifications, or mask sites. And, the layer specific process characteristics include machine model, machine setting identification, and field exposure sequencing.

Abstract: An in-situ apparatus for high resolution imaging in lithographic steppers and scanners (machines) is described. It comprises a multiple field in-situ imaging objective that images the source directly onto the machine reticle or objective plane. The image on the wafer side of the machine is then recorded electronically or in photo resist. Alternative embodiments create source images at locations before or beyond the wafer plane that can be more conveniently recorded with sensors embedded in the wafer stage chuck.

Abstract: The present invention is related to oxindole derivatives of structure (I), compositions containing the same, and methods of use and manufacture of the same. Such compounds generally are useful pharmacologically as agents in those disease states alleviated by the alteration of mitogen activated signaling pathways in general, and in particular in the inhibition or antagonism of protein kinases, which pathologically involve aberrant cellular proliferation. Such disease states include tumor growth, restenosis, atherosclerosis, pain and thrombosis. In particular, the present invention relates to a series of substituted oxindole compounds, which exhibit Trk family protein tyrosine kinase inhibition, and which are useful in cancer therapy and chronic pain indications.

Abstract: A process for providing illumination source conditions for the accurate determination Zernike tilt coefficients in the presence of coma is described. Large feature-shift coma sensitivity is simulated for a range of illumination conditions. The resulting source sensitivity data is modeled and a practical array of source shapes, each of which is optimized to eliminate the effects of transverse distortion due to third-order coma, is identified. The optimized set of source shapes can be used to more accurately determine Zernike terms a2 and a3 using a variety of methods. Knowledge of the lens distortion data in the absence of coma induced shifts can be entered into more traditional overlay regression routines to better identify systematic and random error.

Abstract: A method is described that comprises executing a service selection method on an off load processor of a computing system to select an available network service for handling traffic sent to/from a handheld device. The execution of the service selection method is performed while a main CPU of said computing system is in a low power state.

Abstract: A projection lens distortion error map is created using overlay targets and a special numerical algorithm. A reticle including an array of overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic stepper. After exposure, the overlay targets are measured for placement error. The resulting overlay error data is then supplied to a software program that generates a lens distortion error map for the photolithographic projection system.

Abstract: Work machines having linkages may need to have the linkage assembly locked in a predetermined position to prevent damage to an implement attached to the work machine, to prevent tipping of the work machine, to operate the implement, or other reasons. Locking the linkage assembly, however, can create significant loads on the linkage assembly. The disclosed method and apparatus is for a work machine that comprises a chassis, at least one linkage assembly attached to the work machine, at least one restraint having a first-end portion and a second-end portion, the second-end portion being attached to the chassis and the first-end portion being attached to the linkage assembly, the restraint transferring a load from the linkage assembly to the chassis.

Abstract: An electro-optical, automatic meter reader for enabling a consumer to view and manage power consumption through a browser. A sensor attached to a bracket is mounted to the outside cover of a utility meter without modification of the meter or removal of its housing. A data-collector stores data obtained from the sensor via a serial port which may also provide power for the sensor, thus avoiding use of a dedicated power supply. The data-collector connects to a computer which provides a centralized object through which to view and manage power consumption. The real-time and combined historic data can be used to forecast whether usage will fall above or below a predetermined usage level at the end of a given period of time. In response to a forecast exceeding the level, the computer displays the appropriate graph in a red colored bar within a quantity vs. time chart. The computer may control power consuming devices.

Abstract: A process for forming reinforced cartons in which one or more reinforcing strips are laminated to a carton material along a processing line or path. As the reinforcing strips and carton material are fed along the processing path, cold set and hot melt adhesive materials are applied to resist de-lamination of the reinforcing strips and carton material during downstream cutting operations.

Abstract: A pneumatic endstop surface effect damper including an air piston housing with an air piston movable in an up stroke first direction and an opposite down stroke second direction inside the air piston housing and along the air piston inner housing wall with the air piston dividing the inner chamber into a first upper variable volume chamber and a second lower variable volume chamber.

Abstract: A kit for converting a cross-legged folding cot into a tiered cot, which stilt legs having a longitudinal axis, a top end and a bottom end. A female coupling is positioned at the top end of each of the stilt legs. Each female coupling is offset from the longitudinal axis by between 45 degrees and 65 degrees, and is adapted to receive a leg from a first cross-legged folding cot. With each female coupling holding a leg of a first cross-legged folding cot, the first cot is effectively elevated, such that gear can be stowed or a second cot can be positioned in the space provided beneath the first cot between the stilt legs.

Abstract: A method and apparatus are provided for restoring the software image of a customer information handling system (IHS) to the same software image it had when it left the factory or other software installation facility. The customer IHS enters a re-imaging mode wherein it requests a software download server to recreate the software image originally shipped with that particular IHS. Once the replacement software image is created, the customer IHS downloads the replacement software image to the media drive of the customer IHS.

Abstract: A wafer stage overlay error map is created using standard overlay targets and a special numerical algorithm. A reticle including a 2-dimensional array of standard overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic exposure tool. After exposure, the overlay targets are measured for placement error using a conventional overlay metrology tool. The resulting overlay error data is then supplied to a software program that generates a 2-dimensional wafer stage distortion and yaw overlay error map.

Abstract: An apparatus and method for manufacturing and using a calibrated registration reference wafer in a semiconductor manufacturing facility. A reference reticle consisting of a 2-dimensional array of standard alignment attributes is exposed several times onto a photoresist coated semiconductor wafer using a photolithographic exposure tool. After the final steps of the lithographic development process the resist patterned wafer is physically etched using standard techniques to create a permanent record of the alignment attribute exposure pattern. The permanently recorded alignment attributes are measured for placement error using a conventional overlay metrology tool. The resulting overlay error data is used to generate a calibration file that contains the positions of the alignment attributes on the reference wafer. The reference wafer and calibration file can be used to determine the wafer stage registration performance for any photolithographic exposure tool.

Abstract: A wafer stage overlay error map is created using standard overlay targets and a special numerical algorithm. A reticle including a 2-dimensional array of standard overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic exposure tool. After exposure, the overlay targets are measured for placement error using a conventional overlay metrology tool. The resulting overlay error data is then supplied to a software program that generates a 2-dimensional wafer stage distortion and yaw overlay error map.

Abstract: An apparatus and method for manufacturing and using a calibrated registration reference wafer in a semiconductor manufacturing facility. A reference reticle consisting of a 2-dimensional array of standard alignment attributes is exposed several times onto a photoresist coated semiconductor wafer using a photolithographic exposure tool. After the final steps of the lithographic development process the resist patterned wafer is physically etched using standard techniques to create a permanent record of the alignment attribute exposure pattern. The permanently recorded alignment attributes are measured for placement error using a conventional overlay metrology tool. The resulting overlay error data is used to generate a calibration file that contains the positions of the alignment attributes on the reference wafer. The reference wafer and calibration file can be used to determine the wafer stage registration performance for any photolithographic exposure tool.

Abstract: An element for an in home power line network is housed within the power supply of laptop computer. The element communicates with the power line and carries out network operations over that line. The device also includes logic therein which automatically detects the format of the network being communicated with so that a number of different network types can be automatically connected.

Abstract: A projection lens distortion error map is created using standard overlay targets and a special numerical algorithm. A reticle including a 2-dimensional array of standard overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic stepper. After exposure, the overlay targets are measured for placement error using a conventional overlay metrology tool. The resulting overlay error data is then supplied to a software program that generates a lens distortion error map for the photolithographic projection system.

Abstract: A projection lens distortion error map is created using standard overlay targets and a special numerical algorithm. A reticle including a 2-dimensional array of standard overlay targets is exposed several times onto a photoresist coated silicon wafer using a photolithographic stepper. After exposure, the overlay targets are measured for placement error using a conventional overlay metrology tool. The resulting overlay error data is then supplied to a software program that generates a lens distortion error map for the photolithographic projection system.