Patents by Inventor Robert Innes

Robert Innes has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7982951
    Abstract: A digitally controlled platform for precise celestial tracking of astronomical telescopes, generally those having an independent pointing mechanism. A movable stage carrying the telescope is moved relative to a base by three digitally controlled actuators each of which determines the distance between a point fixed in the base and a point fixed stage. The base and stage otherwise are connected by a mechanism that holds a single point fixed in the base in coincidence with a single point fixed in the stage. It functions without approximation at any digitally specified latitude and longitude, enabling astrophotography with alt/azimuth mounted telescopes and diurnal tracking through the zenith. The digital controller may be a personal computer laptop running a multitasking operating system linked to the platform electronics by a Universal Serial Bus cable. Novel software design allows precise tracking, control, and calibration in spite of operating system and Universal Serial Bus latency.
    Type: Grant
    Filed: November 8, 2010
    Date of Patent: July 19, 2011
    Inventors: Robert Innes, Stephen LeRoy Bursch
  • Patent number: 7617807
    Abstract: A multiple cylinder internal combustion engine having a camshaft-driven valvetrain with a camshaft disposed within an engine block includes at least two intake and/or exhaust valves with a pair of valves operated by a common camshaft lobe and a cam follower. The valvetrain may include independently operable mechanical or hydraulic lash adjusters. The cam follower contacts the common camshaft lobe and at least two pushrods with each pushrod having an associated single plane rocker arm which couples to a fulcrum mounted to the cylinder head to actuate the at least two valves.
    Type: Grant
    Filed: November 30, 2005
    Date of Patent: November 17, 2009
    Assignee: Ford Global Technologies, LLC
    Inventors: Matthew Diggs, Wally Beaber, Robert Innes
  • Publication number: 20070119397
    Abstract: A multiple cylinder internal combustion engine having a camshaft-driven valvetrain with a camshaft disposed within an engine block includes at least two intake and/or exhaust valves with a pair of valves operated by a common camshaft lobe and a cam follower. The valvetrain may include independently operable mechanical or hydraulic lash adjusters. The cam follower contacts the common camshaft lobe and at least two pushrods with each pushrod having an associated single plane rocker arm which couples to a fulcrum mounted to the cylinder head to actuate the at least two valves.
    Type: Application
    Filed: November 30, 2005
    Publication date: May 31, 2007
    Applicant: FORD GLOBAL TECHNOLOGIES, LLC
    Inventors: Matthew Diggs, Wally Beaber, Robert Innes
  • Patent number: 6720565
    Abstract: The present invention relates to methods of predicting proximity heating of resists in electron beam lithography in real-time as the writing proceeds enabling beam compensation in current and/or dwell time to be performed during writing. A method of using a precomputed kernel capable of proximity resist temperature evaluation in real-time as beam writing proceeds by scalar product of the kernel with a graded cell size coverage map. A shifted impulse response function is shown to give the kernel values accurate to within a few percent.
    Type: Grant
    Filed: October 26, 2001
    Date of Patent: April 13, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Robert Innes, Sergey Babin, Robin Teitzel, Lee Veneklasen
  • Publication number: 20020148978
    Abstract: The present invention relates to methods of predicting proximity heating of resists in electron beam lithography in real-time as the writing proceeds enabling beam compensation in current and/or dwell time to be performed during writing. A method of using a precomputed kernel capable of proximity resist temperature evaluation in real-time as beam writing proceeds by scalar product of the kernel with a graded cell size coverage map. A shifted impulse response function is shown to give the kernel values accurate to within a few percent.
    Type: Application
    Filed: October 26, 2001
    Publication date: October 17, 2002
    Applicant: Applied Materials, Inc.
    Inventors: Robert Innes, Sergey Babin, Robin Teitzel, Lee Veneklasen, Mary Veneklasen
  • Patent number: 6429363
    Abstract: According to the invention, there is provided an inbred corn plant designated 94INK1B. This invention thus relates to the plants, seeds and tissue cultures of the inbred corn plant 94INK1B, and to methods for producing a corn plant produced by crossing the inbred corn plant 94INK1B with itself or with another corn plant, such as another inbred. This invention further relates to corn seeds and plants produced by crossing the inbred plant 94INK1B with another corn plant, such as another inbred, and to crosses with related species. This invention further relates to the inbred and hybrid genetic complements of the inbred corn plant 94INK1B, and also to the SSR and genetic isozyme typing profiles of inbred corn plant 94INK1B.
    Type: Grant
    Filed: January 8, 2001
    Date of Patent: August 6, 2002
    Assignee: Dekalb Genetics Corporation
    Inventors: Robert Innes, Jon Popi
  • Patent number: 6420717
    Abstract: The present invention relates to methods and procedures for determining resist temperature during energy beam lithography and adjusting process parameters, including reducing the beam current, to compensate for increased resist sensitivity due to heating. The present invention relates to methods of predicting resist heating in real-time as the writing proceeds thereby enabling beam compensation to be performed in real-time. A linear superposition approximation is described that provides a procedure for estimating the resist temperature at the point presently being written from previously written points. The present invention makes use of the thermal history of the pattern previously written as that history is recorded in the line of pixels immediately preceding the line whose temperature is to be determined prior to e-beam exposure, and a single number representing the thermal history of lines written before the immediately preceding line.
    Type: Grant
    Filed: April 11, 2000
    Date of Patent: July 16, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Sergey Babin, Robert Innes
  • Publication number: 20020062505
    Abstract: According to the invention, there is provided an inbred corn plant designated 94INK1B. This invention thus relates to the plants, seeds and tissue cultures of the inbred corn plant 94INK1B, and to methods for producing a corn plant produced by crossing the inbred corn plant 94INK1B with itself or with another corn plant, such as another inbred. This invention further relates to corn seeds and plants produced by crossing the inbred plant 94INK1B with another corn plant, such as another inbred, and to crosses with related species.
    Type: Application
    Filed: January 8, 2001
    Publication date: May 23, 2002
    Inventors: Robert Innes, Jon Popi
  • Patent number: 6379851
    Abstract: The present invention relates to methods of predicting proximity heating in real-time as the writing proceeds enabling beam compensation to be performed in real-time. Particular attention is given to vector scanning in which the pattern of writing does not follow prescribed kinematics, but the writing tends to cluster into cells. A library of standard cells is constructed. As writing of the pattern proceeds, the individual flashes are agglomerated into cells that are compared with standard cells to determine proximity heating in the resist as a function of the distance of the previously written cells from the point of present writing, and the elapsed time since writing a previously written cell. Present writing snaps to a sufficiently coarse space-time grid to limit the computational burden but fine enough the represent variations in temperature over space and time. Further agglomeration of cells into super-cells, super-super-cells, etc. are also described.
    Type: Grant
    Filed: July 31, 2000
    Date of Patent: April 30, 2002
    Assignee: Applied Materials, Inc.
    Inventor: Robert Innes
  • Patent number: 6373071
    Abstract: The present invention relates to methods of predicting proximity heating of resists in electron beam lithography in real-time as the writing proceeds enabling beam compensation in current and/or dwell time to be performed during writing. A shifted impulse response function is shown to give proximity heating results accurate to within a few percent. A method of using a precomputed kernel capable of proximity resist temperature evaluation in real-time as beam writing proceeds.
    Type: Grant
    Filed: June 30, 1999
    Date of Patent: April 16, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Robert Innes, Sergey Babin, Robin Teitzel, Lee Veneklasen
  • Patent number: 6365806
    Abstract: According to the invention, there is provided an inbred corn plant designated 94INK1A. This invention thus relates to the plants, seeds and tissue cultures of the inbred corn plant 94INK1A, and to methods for producing a corn plant produced by crossing the inbred corn plant 94INK1A with itself or with another corn plant, such as another inbred. This invention further relates to corn seeds and plants produced by crossing the inbred plant 94INK1A with another corn plant, such as another inbred, and to crosses with related species. This invention further relates to the inbred and hybrid genetic complements of the inbred corn plant 94INK1A, and also to the SSR and genetic isozyme typing profiles of inbred corn plant 94INK1A.
    Type: Grant
    Filed: January 31, 2000
    Date of Patent: April 2, 2002
    Assignee: Dekalb Genetics Corporation
    Inventors: Robert Innes, Jon Popi
  • Patent number: 6326635
    Abstract: A shield assembly for reducing electron fogging effects in electron beam lithography. This shield, located between an electron beam column final aperture and the beam target, is of multiple vanes with sharp edges pointing towards the electron beam incident point on the target; the vanes are conically shaped and concentric around the electron beam path, which travels through the center of the assembly. Additionally, the sharp edges are such that they present oblique surfaces at the ends of the vanes angled between 10° and 20° relative to the outer vane surface and these oblique surfaces face towards the electron beam path. Furthermore, the shield assembly may also have the vanes angled towards the beam incident point such that the vertex of the conical vane assembly is coincident with the beam incident point.
    Type: Grant
    Filed: July 30, 1999
    Date of Patent: December 4, 2001
    Assignee: Etec Systems, Inc.
    Inventors: Robert Innes, Lee H. Veneklasen, Allan L. Sagle, Sergey Babin, Chen Hwa
  • Patent number: 6219146
    Abstract: A laser beam or other parallel light beam divides at a beamsplitter into sample and reference beams. The sample beam reflects from a reflective surface back to the beamsplitter, and the reference beam reflects from a retroreflector back to the beamsplitter. The beams are then directed into a telescope. The angle between sample and reference beams at the telescope is proportional to the angle between the laser beam and the normal to the reflective surface. The telescope collects both sample beam and reference beam and transforms each beam into a sharply defined point image. The lateral separation between the two point images is proportional to the magnification of the telescope and to the angle formed at the telescope between the sample beam and the reference beam. If the reflective surface is accurately aligned relative to the laser beam, then the two point images are substantially superposed on one another.
    Type: Grant
    Filed: July 9, 1999
    Date of Patent: April 17, 2001
    Assignee: Etec Systems, Inc.
    Inventors: Robert Innes, William A. Eckes
  • Patent number: 5847959
    Abstract: An electron beam pattern generating system for exposing a pattern on a substrate using a raster scan method. The system stores a rasterized representation of the pattern as a plurality of regular pixel dose exposure levels. These pixel dose exposure levels are evaluated by the system for one or more proximity effects and corrections to the dose exposure level and/or pixel location are calculated. The system includes apparatus for both calculation and storage of intermediate and final results as required. As they are calculated, the corrections are provided to an exposure dose modulator wherein they are applied to forming the pattern. Thus corrections for both long range and short range proximity effects due to both electron scattering and heating as well as for proximity effects due to global thermal expansion can be calculated and provided during run-time and a corrected pattern exposed.
    Type: Grant
    Filed: January 28, 1997
    Date of Patent: December 8, 1998
    Assignee: Etec Systems, Inc.
    Inventors: Lee H. Veneklasen, Robert Innes, Sergey Babin, David Trost, Jeffrey Varner
  • Patent number: 3944844
    Abstract: The invention is concerned with a float-operated electrical switch assembly comprising a vertical tubular housing, at least the lower end of which is arranged to be open to a liquid the level of which is to be monitored. A float is restrained to move vertically in the housing with changes in the liquid level and a magnet mounted on the float cooperates with a magnetically responsive switch actuator which is contained in a tubular casing of non-magnetic material extending into the housing from the side of the housing. The switch assembly is primarily intended for a low level alarm.
    Type: Grant
    Filed: July 30, 1974
    Date of Patent: March 16, 1976
    Assignee: Ronald Trist Controls Limited
    Inventor: Robert Innes