Patents by Inventor Robert J. Chong
Robert J. Chong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210174453Abstract: A method, system and/or computer usable program product for risk assessment of user activities including receiving a request for a quote for services regarding a user and user activities including receiving first information regarding the user and the user activities; utilizing the first information to automatically identify second information on-line from at least one third party regarding the user; automatically modeling the user and the user activities based on the first information and the second information to assess risks associated with the user and the user activities of undesired events; automatically modeling costs of the assessed risks for providing services covering the undesired events arising from the user activities; and automatically providing the quote for the services covering the undesired events arising from the user activities.Type: ApplicationFiled: December 6, 2020Publication date: June 10, 2021Inventors: Ryan T. Anderson, Deepak V. Shah, Tracey Lynn Berg, Jonathan D. Sauer, Robert J. Chong
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Patent number: 8359494Abstract: A method and an apparatus are provided for parallel fault detection. The method comprises receiving data associated with processing of a workpiece by a first processing tool, receiving data associated with processing of a workpiece by a second processing tool and comparing at least a portion of the received data to a common fault model to determine if a fault associated with at least one of the processing of the workpiece by the first processing tool and processing of the workpiece by the second processing tool occurred.Type: GrantFiled: December 18, 2002Date of Patent: January 22, 2013Assignee: GLOBALFOUNDRIES Inc.Inventors: Elfido Coss, Jr., Ernest D. Adams, III, Robert J. Chong, Howard E. Castle, Thomas J. Sonderman, Alexander J. Pasadyn
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Patent number: 7774670Abstract: A method includes retrieving a group test parameter determined based on test results associated with a plurality of integrated circuit devices. A particular integrated circuit device is tested using a test program and the group test parameter.Type: GrantFiled: September 11, 2007Date of Patent: August 10, 2010Assignee: GLOBALFOUNDRIES Inc.Inventors: Richard J. Markle, Douglas C. Kimbrough, Eric O. Green, Robert J. Chong
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Patent number: 7473566Abstract: A method includes defining a plurality of objectives for a film formation process and employing a control equation incorporating the plurality of objectives to generate at least one operating recipe parameter for the film formation process. A system includes a film formation unit and a process control unit. The film formation unit is adapted to perform a film formation process in accordance with an operating recipe. The process control unit is adapted to define a plurality of objectives for the film formation process and employ a control equation incorporating the plurality of objectives to generate at least one operating recipe parameter for the film formation process.Type: GrantFiled: February 3, 2004Date of Patent: January 6, 2009Assignee: Advanced Micro Devices, Inc.Inventors: Matthew A. Purdy, Robert J. Chong
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Patent number: 7424392Abstract: A method and an apparatus are provided for applying a self-adaptive filter to a drifting process. The method includes processing a workpiece, measuring an output characteristic of the processed workpiece and modifying a previous estimated process state based at least on the measured output characteristic. The method further includes estimating a next process state based at least on the modified previous estimated process state.Type: GrantFiled: December 18, 2002Date of Patent: September 9, 2008Assignee: Advanced Micro Devices, Inc.Inventors: Jin Wang, Robert J. Chong, Christopher A. Bode, Si-Zhao J. Qin, Alexander J. Pasadyn
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Patent number: 7186487Abstract: The present invention is generally directed to various methods of controlling exposure processes by monitoring photon levels, and various systems for accomplishing same. In one embodiment, the method comprises performing an exposure process by generating light comprised of a number of photons from a light source to expose at least a portion of a layer of photo-sensitive material, counting a number of photons incident on at least a portion of the layer of photo-sensitive material, and controlling at least one of a duration of the exposure process and an irradiance of the light source based upon the counted number of photons.Type: GrantFiled: February 3, 2004Date of Patent: March 6, 2007Assignee: Advanced Micro Devices, Inc.Inventor: Robert J. Chong
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Patent number: 7117062Abstract: A method and an apparatus for characterizing an uncertainty factor relating to processing workpieces. A first processing step is performed upon a workpiece. A first uncertainty factor associated with the first processing step is calculated. A final uncertainty factor associated with an end-of-line parameter relating to the workpiece is calculated based upon the first uncertainty factor. A process control function based upon the final uncertainty factor is performed.Type: GrantFiled: December 18, 2002Date of Patent: October 3, 2006Assignee: Advanced Micro Devices, Inc.Inventors: Thomas J. Sonderman, Robert J. Chong, Brian K. Cusson, Alexander J. Pasadyn
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Patent number: 7100081Abstract: A method includes receiving a current residual vector. The current residual vector is compared to a plurality of historical residual vectors. Each historical residual vector has an associated fault classification code. At least one of the historical residual vectors is selected responsive to determining that the current residual vector matches at least one of the historical residual vectors. A fault condition is classified based on the fault classification code associated with the selected historical residual vector.Type: GrantFiled: October 9, 2003Date of Patent: August 29, 2006Assignee: Advanced Micro Devices, Inc.Inventors: Matthew A. Purdy, Robert J. Chong, Gregory A. Cherry, Richard J. Markle
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Patent number: 7020535Abstract: A method includes defining a design window for a manufacturing process performed by a tool and a process window within the design window. A workpiece likely to have a characteristic outside the process window is identified. The characteristic of the identified workpiece is measured. A control model for controlling the tool is updated using the measured characteristic. A system includes a tool, a process controller, a metrology tool, and a sampling controller. The tool is adapted to process workpieces in accordance with a manufacturing process. The manufacturing process has an associated design window and a process window defined within the design window. The process controller is adapted to control the tool using a control model. The sampling controller is adapted to identify a workpiece likely to have a characteristic outside the process window and direct the metrology tool to measure the characteristic of the identified workpiece.Type: GrantFiled: November 6, 2003Date of Patent: March 28, 2006Assignee: Advanced Micro Devices, Inc.Inventors: Christopher A. Bode, J. Broc Stirton, Robert J. Chong
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Patent number: 6961636Abstract: A method includes processing a plurality of workpieces in accordance with an operating recipe. Metrology data associated with the processing is collected. A control model including at least one tuning parameter having a default value is provided. A plurality of perturbations is introduced to shift the tuning parameter from its default value. Control actions are generated based on the metrology data and the perturbations to the tuning parameter in the control model to modify the operating recipe. An error signal associated with each of the perturbations is generated. The default value of the tuning parameter is modified based on the error signals.Type: GrantFiled: April 19, 2002Date of Patent: November 1, 2005Assignee: Advanced Micro Devices Inc.Inventors: Robert J. Chong, Alexander J. Pasadyn, Thomas J. Sonderman
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Patent number: 6953697Abstract: The present invention is generally directed to an advanced process control of the manufacture of memory devices, and a system for accomplishing same. In one illustrative embodiment, the method comprises performing at least one process operation to form at least one layer of an oxide-nitride-oxide stack of a memory cell, the stack being comprised of a first layer of oxide positioned above a first layer of polysilicon, a layer of silicon nitride positioned above the first layer of oxide, and a second layer of oxide positioned above the layer of silicon nitride. The method further comprises measuring at least one characteristic of at least one of the first layer of polysilicon, the first oxide layer, the layer of silicon nitride, and the second layer of oxide and adjusting at least one parameter of at least one process operation used to form at least one of the first oxide layer, the layer of silicon nitride and the second oxide layer if the measured at least one characteristic is not within acceptable limits.Type: GrantFiled: October 22, 2002Date of Patent: October 11, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Howard E. Castle, Robert J. Chong, Brian K. Cusson, Eric O. Green
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Patent number: 6912437Abstract: A method includes performing at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. An electrical performance characteristic of the feature is measured. The measured electrical performance characteristic is compared to a target value for the electrical performance characteristic. At least one parameter of the operating recipe is determined based on the comparison. A system includes a process tool, a metrology tool, and a controller. The process tool is configured to perform at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. The metrology tool is configured to measure an electrical performance characteristic of the feature. The controller is configured to compare the measured electrical performance characteristic to a target value for the electrical performance characteristic and determine at least one parameter of the operating recipe based on the comparison.Type: GrantFiled: September 30, 2002Date of Patent: June 28, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Robert J. Chong, Jin Wang
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Patent number: 6912433Abstract: A method and apparatus are provided for determining a next tool state based on fault detection information. The method comprises receiving operational data associated with processing of a workpiece by a processing tool, determining at least a portion of noise associated with the processing of the workpiece based on analyzing the operational data and estimating a next state of the processing tool based on at least the determined portion of the noise.Type: GrantFiled: December 18, 2002Date of Patent: June 28, 2005Assignee: Advanced Mirco Devices, Inc.Inventors: Robert J. Chong, Michael L. Miller, Alexander J. Pasadyn, Eric O. Green
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Patent number: 6907369Abstract: A method for modifying design constraints based on observed performance includes measuring a characteristic of a plurality of devices manufactured in a process flow. A design constraint associated with the characteristic is defined. A performance metric relating the performance of the devices as a function of the measured characteristic and the design constraint is generated. The design constraint is modified based on the performance metric. A manufacturing system includes a metrology tool and a design rule monitor. The metrology tool is configured to measure a characteristic of a plurality of devices manufactured in a process flow. The design rule monitor is configured to receive a design constraint associated with the characteristic, generate a performance metric relating the performance of the devices as a function of the measured characteristic and the design constraint, and modify the design constraint based on the performance metric.Type: GrantFiled: May 2, 2003Date of Patent: June 14, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Richard J. Markle, Robert J. Chong, Alexander J. Pasadyn
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Patent number: 6871114Abstract: A method and an apparatus for adjusting a process controller based upon a fault detection analysis. A process step upon a workpiece is performed using a processing tool. Manufacturing data relating to processing of the workpiece is acquired. The manufacturing data may include metrology data relating to the processed workpiece and/or tool state data relating to the tool state of a processing tool. A metrology/tool state data integration process is performed based upon the acquired manufacturing data. The metrology/tool state data integration process includes performing an assessment of a tool health related to the processing tool and adjusting an emphasis of the metrology data based upon the assessment of the tool health.Type: GrantFiled: August 30, 2002Date of Patent: March 22, 2005Inventors: Eric O. Green, Matthew A. Purdy, Elfido Coss, Jr., Christopher A. Bode, Robert J. Chong, Gregory A. Cherry
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Patent number: 6842661Abstract: A method and an apparatus for performing process control at an interconnect level. A process step upon a workpiece is performed. Manufacturing data relating to an interconnect location on the workpiece is acquired. An interconnect characteristic control process is performed based upon the manufacturing data. The interconnect characteristic control process includes controlling a process relating to a structure associated with the interconnect location on the workpiece to control a characteristic relating to the interconnect location.Type: GrantFiled: September 30, 2002Date of Patent: January 11, 2005Assignee: Advanced Micro Devices, Inc.Inventors: Robert J. Chong, Eric O. Green
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Patent number: 6804619Abstract: A method is provided for a process control based on tool health data. The method comprises processing a workpiece using a processing tool, receiving trace data associated with the processing of the workpiece from the processing tool and determining at least one value associated with a health of a portion of the processing tool based on at least a portion of the received trace data. The method further comprises adjusting processing of another workpiece based on the determined health value.Type: GrantFiled: August 30, 2002Date of Patent: October 12, 2004Assignee: Advanced Micro Devices, Inc.Inventors: Robert J. Chong, Eric O. Green, Jin Wang
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Patent number: 6790376Abstract: In general, the present invention is directed to methods of using weight or mass measurements to control various semiconductor manufacturing processes, and systems for accomplishing same. One illustrative method comprises providing a substrate, performing a deposition process to form a process layer above the substrate, determining a weight or mass of the process layer formed above the substrate, and controlling at least one parameter of the deposition process based upon the determined weight or mass of the process layer. One illustrative system in accordance with the present invention comprises a deposition tool for performing a deposition process to form a process layer above a substrate, a pressure sensor in contact with the substrate for sensing a pressure induced as a result of the process layer formed above the substrate, and a controller for controlling at least one parameter of the deposition process based upon the sensed pressure.Type: GrantFiled: July 23, 2001Date of Patent: September 14, 2004Assignee: Advanced Micro Devices, Inc.Inventors: Richard J. Markle, Robert J. Chong
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Publication number: 20040123182Abstract: A method and an apparatus are provided for parallel fault detection. The method comprises receiving data associated with processing of a workpiece by a first processing tool, receiving data associated with processing of a workpiece by a second processing tool and comparing at least a portion of the received data to a common fault model to determine if a fault associated with at least one of the processing of the workpiece by the first processing tool and processing of the workpiece by the second processing tool occurred.Type: ApplicationFiled: December 18, 2002Publication date: June 24, 2004Inventors: Elfido Cross, Ernest D. Adams, Robert J. Chong, Howard E. Castle, Thomas J. Sonderman, Alexander J. Pasadyn
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Publication number: 20040093110Abstract: A method includes performing at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. An electrical performance characteristic of the feature is measured. The measured electrical performance characteristic is compared to a target value for the electrical performance characteristic. At least one parameter of the operating recipe is determined based on the comparison. A system includes a process tool, a metrology tool, and a controller. The process tool is configured to perform at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. The metrology tool is configured to measure an electrical performance characteristic of the feature. The controller is configured to compare the measured electrical performance characteristic to a target value for the electrical performance characteristic and determine at least one parameter of the operating recipe based on the comparison.Type: ApplicationFiled: September 30, 2002Publication date: May 13, 2004Inventors: Robert J. Chong, Jin Wang