Patents by Inventor Robert J. Hatfield

Robert J. Hatfield has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240040316
    Abstract: In an example there is provided a first integrated circuit. The first integrated circuit is configured to receive an audio signal and configured to drive an audio transducer based on the received audio signal. The first integrated circuit is configured to transmit a portion of the audio signal to a second integrated circuit.
    Type: Application
    Filed: June 16, 2023
    Publication date: February 1, 2024
    Applicant: Cirrus Logic International Semiconductor Ltd.
    Inventors: Jonathan E. EKLUND, Daniel WEBER, Andrew I. BOTHWELL, Robert J. HATFIELD
  • Patent number: 6509960
    Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
    Type: Grant
    Filed: February 28, 2001
    Date of Patent: January 21, 2003
    Assignee: Micron Technology, Inc.
    Inventors: David R. Johnson, Joe Lee Phillip, Todd C. Nielsen, Robert J. Hatfield
  • Patent number: 6429928
    Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
    Type: Grant
    Filed: September 20, 1999
    Date of Patent: August 6, 2002
    Assignee: Micron Technology, Inc.
    Inventors: David R. Johnson, Joe Lee Phillips, Todd C. Nielsen, Robert J. Hatfield
  • Publication number: 20010046043
    Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
    Type: Application
    Filed: September 20, 1999
    Publication date: November 29, 2001
    Inventors: DAVID R. JOHNSON, JOE LEE PHILLIPS, TODD C. NIELSEN, ROBERT J. HATFIELD
  • Publication number: 20010009459
    Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
    Type: Application
    Filed: February 28, 2001
    Publication date: July 26, 2001
    Inventors: David R. Johnson, Joe Lee Phillip, Todd C. Nielsen, Robert J. Hatfield
  • Patent number: 6179448
    Abstract: An apparatus and method for automatically tuning the power and the intensity of light supplied to an illuminated object to some desired values, the apparatus including a light source positionable along at least a first axis with respect to a reflector, a drive assembly for positioning the light source in response to an intensity of light measured by a light meter positioned to sample light reflected from the object along a reflected light path, and a diaphragm having an adjustable aperture for controlling the amount of light supplied to the object. The light source is automatically positioned along the first axis to achieve a maximum intensity of light on the object. The light source may then be automatically positioned along a second axis and a third axis to achieve respective maximum light intensities on the object.
    Type: Grant
    Filed: February 18, 1998
    Date of Patent: January 30, 2001
    Assignee: Micron Technology, Inc.
    Inventors: David R. Johnson, Peter S. Frank, Joe L. Phillips, Robert J. Hatfield
  • Patent number: 5969805
    Abstract: A method and apparatus for endpoint detection for the stripping of a particular material, such as photo-resist material, from a substrate surface. A beam of light is projected onto the substrate surface and the fluoresced and/or reflected light intensity at a particular wavelength band is measured by a light detector. The light intensity is converted to a numerical value and transmitted electronically to a control mechanism which determines the proper disposition of the substrate. The control mechanism controls the cessation of the stripping process and may control a substrate-handling device which sequentially transfers substrates to and from a stripping chamber.
    Type: Grant
    Filed: November 4, 1997
    Date of Patent: October 19, 1999
    Assignee: Micron Technology, Inc.
    Inventors: David R. Johnson, Joe Lee Phillips, Todd C. Nielsen, Robert J. Hatfield
  • Patent number: 5513443
    Abstract: A dryer for use in an asphalt plant for heating and drying virgin aggregate and also pre-heating reclaimed asphalt products (RAP). A drying drum cylinder having a burner at one end heats and dries virgin aggregate traveling therethrough. A second cylinder near the burner surrounds the drying drum and creates an annular cavity. RAP is introduced and travels through the annular cavity and exits adjacent the drying drum aggregate exit opening. Heat given off by the drying drum increases the temperature within the annular cavity and heats the RAP traveling therethrough. Heated aggregate and RAP first come in contact with one another after exiting the annular cavity and the drying drum and are, thereafter, delivered to a mixing drum.
    Type: Grant
    Filed: January 13, 1995
    Date of Patent: May 7, 1996
    Assignee: Asphalt Drum Mixers, Inc.
    Inventor: Robert J. Hatfield