Patents by Inventor Robert Jeffrey Day

Robert Jeffrey Day has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6544584
    Abstract: A process for removal of undesirable conductive material (e.g., catalyst material and seeped circuit material) on a circuitized substrate and the resultant circuitized substrates disclosed. Such process and resultant circuit effectively address the electrical shorting problems caused by nonremoval of the residual catalyst material and circuit material which has seeped under the residual catalyst material. The process includes the steps of: a) providing a catalyst layer (e.g., palladium and tin) having circuit pattern (e.g., copper) thereon; b) pretreating the catalyst layer and the circuit pattern (e.g., with a cyanide dip) for removal of undesirable portions of each which cause electrical leakage between circuit lines of the circuit pattern; c) oxidizing the catalyst layer and the circuit pattern (e.g.
    Type: Grant
    Filed: March 7, 1997
    Date of Patent: April 8, 2003
    Assignee: International Business Machines Corporation
    Inventors: Edward Lee Arrington, John Christopher Camp, Robert Jeffrey Day, Edmond Otto Fey, Curtis Michael Gunther, Thomas Richard Miller
  • Patent number: 6063481
    Abstract: A process for removal of undesirable conductive material (e.g., catalyst material and seeped circuit material) on a circuitized substrate and the resultant circuitized substrates disclosed. Such process and resultant circuit effectively address the electrical shorting problems caused by nonremoval of the residual catalyst material and circuit material which has seeped under the residual catalyst material. The process includes the steps of: a) providing a catalyst layer (e.g., palladium and tin) having circuit pattern (e.g., copper) thereon; b) pretreating the catalyst layer and the circuit pattern (e.g., with a cyanide dip) for removal of undesirable portions of each which cause electrical leakage between circuit lines of the circuit pattern; c) oxidizing the catalyst layer and the circuit pattern (e.g.
    Type: Grant
    Filed: March 6, 1998
    Date of Patent: May 16, 2000
    Assignee: International Business Machines Corporation
    Inventors: Edward Lee Arrington, John Christopher Camp, Robert Jeffrey Day, Edmond Otto Fey, Curtis Michael Gunther, Thomas Richard Miller
  • Patent number: 5817405
    Abstract: A process for making a circuitized substrate is defined wherein the substrate is treated with two different, e.g., additive and subtractive, metallization processes. The process is thus able to effectively produce substrates including conductive features, e. g., high density circuit lines and chip heat-sinking pads, of two different degrees of resolution in a cost effective and expeditious manner. The resulting product is also defined.
    Type: Grant
    Filed: February 4, 1997
    Date of Patent: October 6, 1998
    Assignee: International Business Machines Corporation
    Inventors: Anikumar Chinuprasad Bhatt, Ashwinkumar Chinuprasad Bhatt, Robert Jeffrey Day, Thomas Patrick Duffy, Jeffrey Alan Knight, Richard William Malek, Voya Rista Markovich
  • Patent number: 5707893
    Abstract: A process for making a circuitized substrate is defined wherein the substrate is treated with two different, e.g., additive and subtractive, metallization processes. The process is thus able to effectively produce substrates including conductive features, e.g., high density circuit lines and chip heat-sinking pads, of two different degrees of resolution in a cost effective and expeditious manner. The resulting product is also defined.
    Type: Grant
    Filed: December 1, 1995
    Date of Patent: January 13, 1998
    Assignee: International Business Machines Corporation
    Inventors: Anilkumar Chinuprasad Bhatt, Ashwinkumar Chinuprasad Bhatt, Robert Jeffrey Day, Thomas Patrick Duffy, Jeffrey Alan Knight, Richard William Malek, Voya Rista Markovich