Patents by Inventor Robert Johannes Petrus Van Diesen

Robert Johannes Petrus Van Diesen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus configured to position a workpiece
    Patent number: 7679720
    Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.
    Type: Grant
    Filed: February 1, 2008
    Date of Patent: March 16, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig-Schmidt, Harmen Klaas Van der Schoot, Rob Jansen
  • Apparatus configured to position a workpiece
    Publication number: 20080174750
    Abstract: An apparatus is configured to position a workpiece. The apparatus includes a planar base, and a movable stage configured to support the workpiece. The stage is configured to be moved over the planar base. The apparatus also includes an actuator configured to move the stage, a contactless position measurer configured to measure a position of the stage, and a first pump configured to generate a conditioned gas flow in a volume between the measurer and the stage. The base includes a plurality of gas channels provided in the base that provide a path of the conditioned gas flow through the base.
    Type: Application
    Filed: February 1, 2008
    Publication date: July 24, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig-Schmidt, Harmen Klaas Van Der Schoot, Rob Jansen
  • Lithographic apparatus and device manufacturing method
    Patent number: 7359032
    Abstract: A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.
    Type: Grant
    Filed: August 25, 2004
    Date of Patent: April 15, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Michel Pieter Dansberg, Sebastiaan Maria Johannes Cornelissen, Henrikus Herman Marie Cox, Robert Johannes Petrus Van Diesen, Nicolaas Rudolf Kemper, Robert-Han Munnig Schmidt, Harmen Klaas Van Der Schoot, Rob Jansen
  • Lithographic apparatus and device manufacturing method
    Patent number: 6879377
    Abstract: A lithographic projection apparatus includes a conduit that supplies utilities to a movable component in a vacuum chamber such as an object table, associated motor or sensor. The conduit comprises flexible metal bellows preventing out-gassing of the conduit due to the vacuum in the vacuum chamber while allowing movement of the movable component in at least a first degree of freedom.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: April 12, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Hernes Jacobs, Piet Vosters, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Robert Johannes Petrus Van Diesen, David William Callan
  • Lithographic apparatus and device manufacturing method
    Publication number: 20030137643
    Abstract: A lithographic projection apparatus includes a conduit that supplies utilities to a movable component in a vacuum chamber such as an object table, associated motor or sensor. The conduit comprises flexible metal bellows preventing out-gassing of the conduit due to the vacuum in the vacuum chamber while allowing movement of the movable component in at least a first degree of freedom.
    Type: Application
    Filed: November 27, 2002
    Publication date: July 24, 2003
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Hernes Jacobs, Piet Vosters, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Robert Johannes Petrus Van Diesen, David William Callan