Abstract: Apparatus and method for depositing water onto the surface of a substrate passed through the apparatus. The apparatus has a housing that defines an internal atmosphere confined in at least partial isolation from the ambient atmosphere. The housing has a moisture saturation portion, a deposition portion, and a passageway. The moisture saturation portion has a water supply and a vapor reservoir. The water supply contains a quantity of water. The vapor reservoir holds a volume of the interior atmosphere in thermal and phase equilibrium with the water in the water supply. The deposition portion has a plenum wall surrounding a central chamber. The plenum wall is substantially insulated from ambient temperature variations and has a pair of opposed substrate gaps. The gaps define a path for the substrate through the chamber. The passageway communicates with the vapor reservoir and the chamber. A primary heater is disposed to heat the water in the water supply.

Abstract: A method for reforming the surface of a photographic emulsion layer. In the method, the surface of the emulsion layer is dried to at least sensible dryness. Water is then deposited onto the surface of the emulsion layer. The depositing is substantially uniform and in an amount that is less than about 0.80 grams of water per square foot of emulsion layer.