Abstract: In one embodiment, a fluid ejection device includes a substrate with a fluid slot and a membrane adhered to the substrate that spans the fluid slot. A resistor is disposed on top of the membrane over the fluid slot, and a fluid feed hole next to the resistor extends through the membrane to the slot. A shelf extends from the edge of the resistor to the edge of the feed hole, and a passivation layer covers the resistor and part the shelf. An etch-resistant layer is formed partly on the shelf and in between the fluid feed hole and the resistor.

Abstract: A method for fabricating a fluid nozzle array includes forming a circuitry layer onto a substrate, the substrate comprising a stopping layer disposed between a membrane layer and a handle layer, forming a fluid feedhole extending from a surface of the membrane layer to the stopping layer, and forming a fluid supply trench extending from a surface of the handle layer to the stopping layer. A fluid nozzle array includes a substrate including a membrane layer, a stopping layer adjacent to the membrane layer, a handle layer adjacent to the stopping layer, and a set of fluid chambers disposed on a surface of the membrane layer above and along a width of a fluid supply trench extending from a surface of the handle layer to the stopping layer.

Abstract: In one embodiment, a fluid ejection device includes a substrate with a fluid slot and a membrane adhered to the substrate that spans the fluid slot. A resistor is disposed on top of the membrane over the fluid slot, and a fluid feed hole next to the resistor extends through the membrane to the slot. A shelf extends from the edge of the resistor to the edge of the feed hole, and a passivation layer covers the resistor and part the shelf. An etch-resistant layer is formed partly on the shelf and in between the fluid feed hole and the resistor.

Abstract: A method for fabricating a fluid nozzle array includes forming a circuitry layer onto a substrate, the substrate comprising a stopping layer disposed between a membrane layer and a handle layer, forming a fluid feedhole extending from a surface of the membrane layer to the stopping layer, and forming a fluid supply trench extending from a surface of the handle layer to the stopping layer. A fluid nozzle array includes a substrate including a membrane layer, a stopping layer adjacent to the membrane layer, a handle layer adjacent to the stopping layer, and a set of fluid chambers disposed on a surface of the membrane layer above and along a width of a fluid supply trench extending from a surface of the handle layer to the stopping layer.

Abstract: A micromechanical device may include one or more piezoresistive elements whose electrical resistance changes in response to externally or internally induced strain. The present invention leverages the piezoresistive properties of such devices to sense the positional state of the device. A sensing circuit may be integrated into the device that senses an electrical resistance of at least a portion of the micromechanical device and provides information regarding the positional state of the micromechanical device. The micromechanical device may be a compliant device that includes relatively flexible members such as mechanical beams or ribbons. The positional states may be continuous positional states (such as the position of an actuator) or discreet positional states (such as the positional state of a bistable memory device). In certain embodiments, the micromechanical device is a threshold detector that latches to a particular stable configuration when an applied force exceeds a selected value.

Abstract: A micromechanical device may include one or more piezoresistive elements whose electrical resistance changes in response to externally or internally induced strain. The present invention leverages the piezoresistive properties of such devices to sense the positional state of the device. A sensing circuit may be integrated into the device that senses an electrical resistance of at least a portion of the micromechanical device and provides information regarding the positional state of the micromechanical device. The micromechanical device may be a compliant device that includes relatively flexible members such as mechanical beams or ribbons. The positional states may be continuous positional states (such as the position of an actuator) or discreet positional states (such as the positional state of a bistable memory device). In certain embodiments, the micromechanical device is a threshold detector that latches to a particular stable configuration when an applied force exceeds a selected value.