Patents by Inventor Robert Keith Grygier

Robert Keith Grygier has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6281993
    Abstract: Optical information processor and storage of pixelated data pattern in a Fourier plane of a lens as achieved by a plurality of optical elements operating with a spatial light modulator. A laser light source illuminates a data pattern with a wavefront that is created by a phase mask to effect a phase shift. The optical information can be effecitvely processed or stored, for instance, in a holographic data storage system. The holographic data storage system for storing a data array contains illuminated and dark regions including a multi-fold phase shift mask. This affects a linear and non-random shift of an image. The image is stored on a holographic storage medium. There is a spatial light modulator between the input location for the optical data and the storage medium. The phase shift is effected in the Fourier plane.
    Type: Grant
    Filed: March 30, 1998
    Date of Patent: August 28, 2001
    Assignee: International Business Machines Corporation
    Inventors: Maria-Pilar Bernal, Hans Jürgen Coufal, Robert Keith Grygier, Carl Michael Jefferson, Egbert Oesterschoze, Kenneth Francis Walsh
  • Patent number: 5827622
    Abstract: The invention relates to a reflective phase-shifting lithographic mask having a reflective surface comprising a plurality of areas having different refractive indices.
    Type: Grant
    Filed: June 27, 1997
    Date of Patent: October 27, 1998
    Assignee: International Business Machines Corporation
    Inventors: Hans Juergen Coufal, Robert Keith Grygier
  • Patent number: 5717218
    Abstract: A lithographic system for patterned exposure of radiation-sensitive resist comprises a radiation source, a mask, a converging optical element having a focal plane, and a phase-shifting optical element disposed at the focal plane of the converging optical element. The lithographic system produces enhanced images.
    Type: Grant
    Filed: December 28, 1994
    Date of Patent: February 10, 1998
    Assignee: International Business Machines Corporation
    Inventors: Hans Juergen Coufal, Robert Keith Grygier
  • Patent number: 5650632
    Abstract: A lithographic system for patterned exposure of radiation-sensitive resist. The system comprises a radiation source, a mask, a converging optical element having a focal plane, and a phase-shifting optical element disposed at the focal plane of the converging optical element. The lithographic system produces enhanced images.
    Type: Grant
    Filed: May 14, 1996
    Date of Patent: July 22, 1997
    Assignee: International Business Machines Corporation
    Inventors: Hans Juergen Coufal, Robert Keith Grygier