Abstract: The invention relates to a device and its use for multiphoton printing for the additive manufacture of three-dimensional structures or for the inspection of these and other structures of comparable size ratios in the presence of an inspection medium. In order to manufacture and inspect three-dimensional structures that have varying properties and/or material compositions, the device according to the invention is characterized by a locally selective material feed (9), a locally selective material discharge (11) and locally selective, focused emission or reception of electromagnetic radiation.

Abstract: The invention relates to a device and its use for multiphoton printing for the additive manufacture of three-dimensional structures or for the inspection of these and other structures of comparable size ratios in the presence of an inspection medium. In order to manufacture and inspect three-dimensional structures that have varying properties and/or material compositions, the device according to the invention is characterized by a locally selective material feed (9), a locally selective material discharge (11) and locally selective, focused emission or reception of electromagnetic radiation.

Abstract: Imprint templates for use in nanoimprint lithography methods, a nanoimprint device suitable for UV nanoimprint lithography methods and a nanostructuring method for direct structuring of a UV-sensitive imprint material on a substrate are provided. The imprint templates, nanoimprint device and nanostructuring method can be used both for ultraviolet nanoimprint lithography and for thermal nanoimprint lithography. The imprint template includes a nontransparent structured chip and a transparent substrate. An at least partially nontransparent imprint template as well as a UV source situated above the imprint template holder are used for structuring by indirect exposure by reflection of light emitted from the UV radiation source in the direction of a photoactive layer.

Abstract: Imprint templates for use in nanoimprint lithography methods, a nanoimprint device suitable for UV nanoimprint lithography methods and a nanostructuring method for direct structuring of a UV-sensitive imprint material on a substrate are provided. The imprint templates, nanoimprint device and nanostructuring method can be used both for ultraviolet nanoimprint lithography and for thermal nanoimprint lithography. The imprint template includes a nontransparent structured chip and a transparent substrate. An at least partially nontransparent imprint template as well as a UV source situated above the imprint template holder are used for structuring by indirect exposure by reflection of light emitted from the UV radiation source in the direction of a photoactive layer.