Patents by Inventor Robert Koefer

Robert Koefer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8617799
    Abstract: In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. In general, in another aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure.
    Type: Grant
    Filed: September 21, 2009
    Date of Patent: December 31, 2013
    Assignee: API Technologies Corp.
    Inventors: Robert Koefer, Sheng Liu, Thomas Tombler
  • Patent number: 8120861
    Abstract: In general, in one aspect, the invention features an apparatus that includes a plurality of optical elements arranged to form an image of an object. The elements include a first element comprising one or more regions of a polarizing material, the regions being shaped as one or more visual features, a polarizer, and a mounting assembly including a first mount for the first element and a second mount for the polarizer. At least the first or second mount is rotatable with respect to an optical axis between a first orientation and a second orientation. In the first orientation, the visual features are visible in the image of the object and, in the second orientation, the visual features are not visible in the image of the object.
    Type: Grant
    Filed: September 21, 2009
    Date of Patent: February 21, 2012
    Inventors: Martin Moskovits, Qihong Wu, Robert Koefer, Xu Zhang, Linh Nguyen, Thomas Tombler
  • Publication number: 20100291489
    Abstract: Methods include providing an article including a substrate, a first layer supported by the substrate, and an interface between the substrate and the first layer. The substrate is substantially transparent to radiation at a wavelength ? and the first layer is formed from a photoresist. The methods include exposing the first layer to radiation by directing radiation at ? through the substrate to impinge on the interface so that the radiation experiences total internal reflection at the interface.
    Type: Application
    Filed: May 15, 2009
    Publication date: November 18, 2010
    Applicant: API Nanofabrication and Research Corp.
    Inventors: Martin Moskovits, Linh Nguyen, Robert Koefer, Qihong Wu, Xu Zhang, Shiaw-Wen Tai
  • Publication number: 20100073756
    Abstract: In general, in one aspect, the invention features an apparatus that includes a plurality of optical elements arranged to form an image of an object. The elements include a first element comprising one or more regions of a polarizing material, the regions being shaped as one or more visual features, a polarizer, and a mounting assembly including a first mount for the first element and a second mount for the polarizer. At least the first or second mount is rotatable with respect to an optical axis between a first orientation and a second orientation. In the first orientation, the visual features are visible in the image of the object and, in the second orientation, the visual features are not visible in the image of the object.
    Type: Application
    Filed: September 21, 2009
    Publication date: March 25, 2010
    Inventors: Martin Moskovits, Qihong Wu, Robert Koefer, Xu Zhang, Linh Nguyen, Thomas Tombler
  • Publication number: 20100075262
    Abstract: In general, in one aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, the mask feature having a surface comprising a depression, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure. In general, in another aspect, the invention features a method that includes forming layer of a mask material on a surface of a first layer, patterning the layer of the mask material to obtain a mask feature, inducing mass transport of the mask material of the mask feature to obtain a modified mask feature, and transferring a profile of the modified mask feature into the first layer to form a first structure.
    Type: Application
    Filed: September 21, 2009
    Publication date: March 25, 2010
    Inventors: Robert Koefer, Sheng Liu, Thomas Tombler