Abstract: The invention is directed to elements used in high power laser lithographic systems operating at below 250 nm, and in particular to elements that have a coating of selected materials to extend lifetime of the elements; and to a method of preparing the extended lifetime elements. The invention is particularly directed to gratings and mirrors that are coated with silicon dioxide, aluminum oxide or fluorinated silicon dioxide. The coatings of the invention attain their extended life as a result of being deposited while being simultaneously bombarded with an energetic ion plasma.

Abstract: A technique for reducing the appearance of Newton's Rings for a light emitting device is disclosed. The light emitting device comprises an anti-reflective coating on the inner surface of a cover substrate. A method of making a light emitting device is disclosed, together with a method for reducing the formation of Newton's Rings in a device.

Abstract: The invention is directed to hermetically sealed optical lithography components or elements that are hermetically sealed by a durable coat of a hermetically sealing material selected from the group consisting of oxide and fluorinated oxide films. The durable coating of the hermetically sealing material is applied to one of more faces of the optical element, either directly to the face of the element or over a selected coating (for example, an anti-reflective coating) that has been applied to the element. The invention is further directed to a method of making hermetically sealed optical elements.

Abstract: The invention is directed to improved coated metal fluoride single crystal optical elements suitable for use in below 250 nm optical lithography, and particularly below 200 nm lithography. The coated elements of the invention can be lenses, windows, prisms and other elements used in lithographic methods, including the laser sources used therein. The invention is also directed to a method of removing the quasi-Bielby layer formed when a shaped optical element is polished. Removal of the quasi-Bielby layer prior to coating results in improved durability and optical transmission characteristics of the coated lenses. The coating material can be any material that does not impede the transmission of below 250 nm electromagnetic radiation. Fluorine doped silicon dioxide is the preferred coating material.

Abstract: A polarizing effect is achieved for light having wavelengths less than 250 nm by orienting an antireflector at an incidence angle between 65° and 75°. Despite limited choices for materials, the antireflector is constructed of layers that alternate in refractive index to exploit the mechanism of interference for limiting the reflectivity of one linear polarization component of the light. The same combination of layers supports the reflectivity of an orthogonal linear polarization component. The light reflected from the antireflector is highly polarized.

Abstract: The invention is directed to improved coated metal fluoride single crystal optical elements suitable for use in below 250 nm optical lithography, and particularly below 200 nm lithography. The coated elements of the invention can be lenses, windows, prisms and other elements used in lithographic methods, including the laser sources used therein. The invention is also directed to a method of removing the quasi-Bielby layer formed when a shaped optical element is polished. Removal of the quasi-Bielby layer prior to coating results in improved durability and optical transmission characteristics of the coated lenses. The coating material can be any material that does not impede the transmission of below 250 nm electromagnetic radiation. Fluorine doped silicon dioxide is the preferred coating material.

Abstract: The invention is directed to a coated metal fluoride crystals that are resistant to laser-induced damage by a below 250 nm UV laser beam; methods of making such coated crystals, and the use of such coated crystals. The method includes the steps of providing an uncoated metal fluoride crystal of general formula MF2, where M is beryllium, magnesium, calcium, strontium and barium, and mixtures thereof, and coating the uncoated metal fluoride crystal with a coating of a selected material to thereby form a coated metal material resistant to laser induced damage. Preferred coating materials include MgF2, MgF2 doped fused silica and fluorine doped fused silica.

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract: The invention is directed to a coated metal fluoride crystals that are resistant to laser-induced damage by a below 250 nm UV laser beam; methods of making such coated crystals, and the use of such coated crystals. The method includes the steps of providing an uncoated metal fluoride crystal of general formula MF2, where M is beryllium, magnesium, calcium, strontium and barium, and mixtures thereof, and coating the uncoated metal fluoride crystal with a coating of a selected material to thereby form a coated metal material resistant to laser induced damage. Preferred coating materials include MgF2, MgF2 doped fused silica and fluorine doped fused silica.

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract: The invention provides coated optical lithography elements and methods of coating optical elements, and particularly optical photolithography elements for use in below 240 nm optical photolithography systems utilizing vacuum ultraviolet light (VUV) lithography wavelengths no greater than about 193 nm, such as VUV projection lithography systems utilizing wavelengths in the 193 nm or 157 nm region. The optical devices manipulate vacuum ultraviolet lithography light less than 250 nm utilizing a deposited silicon oxyfluoride film. The deposited silicon oxyfluoride optical coating assists in the manipulation of incident light and protects the underlying optical materials, layers, and surfaces.

Abstract: A tray is mounted along a telescoping structure, typically suspended beneath a segment of the telescoping structure. The tray provides a space for a flexible conduit to be gathered into and payed out from as the structure changes in length. A conduit connector couples segments of the conduit and defines a fluid path which makes two substantially right angle turns to increase the minimum radius which the flexible conduit must assume during the expansion and contraction of the structure. The flexible conduit can be attached to rigid conduits extending between the tray and either end of the structure. A Z-shaped conduit connector can be pivotally mounted to the tray, or can be articulated, to increase the usable length of flexible hose stored within the tray.