Patents by Inventor Robert L. Mcanally

Robert L. Mcanally has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6520348
    Abstract: An apparatus and method for diffusion annealing impurities onto a plurality of wafers is described. A hollow wafer holder includes a plurality of first and second slots. The first slots are sized and shaped to receive a pair of wafers. The first slots are angled relative to a longitudinal axis of the wafer holder. The wafer holder is positioned at a first location within an ampoule, with a diffusion source being positioned at a second location within the ampoule. The ampoule is sealed and placed within or near a heat source. The heat source alters the physical state of the diffusion source to allow the entrained impurities to diffuse throughout the ampoule. The inclination of the first slots allows a sufficient clearance between the wafers and the ampoule to allow impurities within a gaseous diffusion source to extend throughout the ampoule. The presence of the second slots allows a more uniform diffusion of the impurities to the wafers.
    Type: Grant
    Filed: April 4, 2000
    Date of Patent: February 18, 2003
    Assignee: Lucent Technologies Inc.
    Inventors: Dutt V. Bulusu, Robert L. Mcanally, Michael Geva, Gustav E. Derkits, Robert A. Resta