Abstract: Provided is a process for the rapid deposition of highly conformal molybdenum- or tungsten-containing films onto microelectronic device substrates under vapor deposition conditions. In the practice of the invention, a first nucleation step is conducted, while utilizing a generally lower concentration of metal precursor than would ordinarily be utilized in the reaction zone. This utilization of lower metal precursor concentrations can be achieved by way of regulating the temperature of the ampoule (housing the precursor), the concentration of the precursor, pressure in the reaction zone, and the duration of the pulse. In this fashion, a generally lower concentration is utilized to form a nucleation layer of greater than or equal to about 3 ?, or up to about 9, 15, or 25 ?, at which time, the conditions for introducing the precursor are advantageously changed and the concentration of the precursor in the reaction zone is increased for the purpose of bulk deposition.

Abstract: The invention provides a process for preparing molybdenum and tungsten oxyhalide compounds which are useful in the deposition of molybdenum and tungsten containing films on various surfaces of microelectronic devices. In the process of the invention, a molybdenum or tungsten trioxide is heated in either a solid state medium or in a melt-phase reaction comprising a eutectic blend comprising alkaline and/or alkaline earth metal salts. The molybdenum or tungsten oxyhalides thus formed may be isolated as a vapor and crystallized to provide highly pure precursor compounds such as MoO2Cl2.

Abstract: A methodology for (a) the etching of films of Al2O3, HfO2, ZrO2, W, Mo, Co, Ru, SiN, or TiN, or (b) the deposition of tungsten onto the surface of a film chosen from Al2O3, HfO2, ZrO2, W, Mo, Co, Ru, Ir, SiN, TiN, TaN, WN, and SiO2, or (c) the selective deposition of tungsten onto metallic substrates, such as W, Mo, Co, Ru, Ir and Cu, but not metal nitrides or dielectric oxide films, which comprises exposing said films to WOCl4 in the presence of a reducing gas under process conditions.

Abstract: Provided is a process for the rapid deposition of highly conformal molybdenum- or tungsten-containing films onto microelectronic device substrates under vapor deposition conditions. In the practice of the invention, a first nucleation step is conducted, while utilizing a generally lower concentration of metal precursor than would ordinarily be utilized in the reaction zone. This utilization of lower metal precursor concentrations can be achieved by way of regulating the temperature of the ampoule (housing the precursor), the concentration of the precursor, pressure in the reaction zone, and the duration of the pulse. In this fashion, a generally lower concentration is utilized to form a nucleation layer of greater than or equal to about 3 ?, or up to about 9, 15, or 25 ?, at which time, the conditions for introducing the precursor are advantageously changed and the concentration of the precursor in the reaction zone is increased for the purpose of bulk deposition.

Abstract: Embodiments of the invention are directed to systems, methods, and computer program products for resource dispensing at a computer terminal using pre-stage capabilities for a completely contactless experience for physical resource distribution. The system identifying one or more tokens within a user application at a pre-stage event, where the user is able to pre-stage a resource dispensing at a computer terminal in the future. The system may review the token selected for confidence and transmit a resource distribution request amount and a security token tied to the identified user application. Upon contactless communication with a computer terminal, the system extracts the resource distribution request information and security token. The system may confirm the resource distribution request information and security token received at pre-stage with a user current token selection and authorize the pre-staged resource distribution at the computer terminal without additional authentication.

Abstract: Contactless dispensing of objects from object-dispensing machines. A digital token is wirelessly communicated to the machine via short-range wireless communication, such as Near Field Communication (NFC) or the like. In response, a push notification is communicated to the user's wireless device, which includes an activatable link for launching a mobile application. In response to launching the mobile application and authenticating the user, the mobile application provides object-dispensing machine-like user interfaces that are configured to allow the user to input object requesting parameters and submit a request for objects to be dispensed from the object-dispensing machine. The request is communicated to the object-dispensing machines (or corresponding backend processing systems) and, once the request is verified, the object-dispensing machine dispenses the requested objects.

Abstract: Provided is methodology for (a) the etching of films of Al2O3, HfO2, ZrO2, W, Mo, Co, Ru, SiN, or TiN, or (b) the deposition of tungsten onto the surface of a film chosen from Al2O3, HfO2, ZrO2, W, Mo, Co, Ru, Ir, SiN, TiN, TaN, WN, and SiO2, or (c) the selective deposition of tungsten onto metallic substrates, such as W, Mo, Co, Ru, Ir and Cu, but not metal nitrides or dielectric oxide films, which comprises exposing said films to WOCl4 in the presence of a reducing gas under process conditions.

Abstract: Solid preforms include a solid sublimation material surrounding a support phase. The preforms combine a solid to be sublimated for use in vapor deposition with a compatible support phase allowing the preform to maintain a shape as the solid sublimates. The preforms may be included in ampules for use in vapor deposition systems. The ampules may include one or more of the preforms, and the preforms may be oriented with respect to one another to control flow within the ampule. The preforms may be made via pressing a powder of the solid sublimation material onto the support phase, or by removing a solvent from a solution of the solid sublimation material.

Abstract: The invention provides a process for preparing molybdenum and tungsten oxyhalide compounds which are useful in the deposition of molybdenum and tungsten containing films on various surfaces of microelectronic devices. In the process of the invention, a molybdenum or tungsten trioxide is heated in either a solid state medium or in a melt-phase reaction comprising a eutectic blend comprising alkaline and/or alkaline earth metal salts. The molybdenum or tungsten oxyhalides thus formed may be isolated as a vapor and crystallized to provide highly pure precursor compounds such as MoO2Cl2.

Abstract: A solid source material is described for forming a tungsten-containing film. The solid source material is tungsten hexacarbonyl, wherein content of molybdenum is less than 1000 ppm. Such solid source material may be formed by a process including provision of particulate tungsten hexacarbonyl raw material of particles of size less than 5 mm, wherein particles of size greater than 1.4 mm are less than 15% of the particles, and wherein content of molybdenum is less than 1000 ppm, and sintering the particulate tungsten hexacarbonyl raw material at temperature below 100° C. to produce the solid source material as a sintered solid.

Abstract: A multipass cell assembly for monitoring of fluid is described, as well as fluid processing systems utilizing same, and associated methods of use of such multipass cell assembly for fluid monitoring. The multipass cell assembly is usefully employed in fluid processing operations such as monitoring of vapor deposition process reactants, e.g., reactants used for vapor deposition metallization of tungsten from a tungsten carbonyl precursor.

Abstract: Vaporizers are described, suited for vaporizing a vaporizable solid source materials to form vapor for subsequent use, e.g., a deposition of metal from organometallic source material vapor on a substrate for manufacture of integrated circuitry, LEDs, photovoltaic panels, and the like. Methods are described of fabricating such vaporizers, including methods of reconfiguring up-flow vaporizers for down-flow operation to accommodate higher flow rate solid delivery of source material vapor in applications requiring same.

Abstract: A solid source material is described for forming a tungsten-containing film. The solid source material is tungsten hexacarbonyl, wherein content of molybdenum is less than 1000 ppm. Such solid source material may be formed by a process including provision of particulate tungsten hexacarbonyl raw material of particles of size less than 5 mm, wherein particles of size greater than 1.4 mm are less than 15% of the particles, and wherein content of molybdenum is less than 1000 ppm, and sintering the particulate tungsten hexacarbonyl raw material at temperature below 100° C. to produce the solid source material as a sintered solid.

Abstract: Vaporizers are described, suited for vaporizing a vaporizable solid source materials to form vapor for subsequent use, e.g., a deposition of metal from organometallic source material vapor on a substrate for manufacture of integrated circuitry, LEDs, photovoltaic panels, and the like. Methods are described of fabricating such vaporizers, including methods of reconfiguring up-flow vaporizers for down-flow operation to accommodate higher flow rate solid delivery of source material vapor in applications requiring same.

Abstract: Embodiments of the invention provide for systems, devices, apparatus, methods, and computer program products for allowing a first agent associated with an entity to initiate contact with a second agent associated with the entity via a contact entry point. The contact entry point is displayed on an interface page and enables a first agent to contact other agents associated with the entity in a faster, more efficient, and better informed manner.

Abstract: Embodiments of the invention provide for systems, devices, apparatus, methods, and computer program products for providing an activatable indicium configured as an entry point for accessing contact information on a user interface. The activatable indicium, which may be a company logo, company name or the like, is not initially readily identifiable as an entry point for accessing the contact information. However, over time and continual use, the user recognizes that the presentation of the indicium regardless of the platform provides for an entry point for accessing contact information.

Abstract: Embodiments of the invention provide for systems, devices, apparatus, methods, and computer program products for providing contact information via a computer network in response to activating an activatable indicium on a user interface. The activatable indicium integrates and provides the contact information for multiple channels of an entity along with statistical information for multiple contact options associated with each channel, and thus enables a user to contact an agent associated with the entity in a faster, more efficient, and better informed manner.

Abstract: Embodiments of the invention provide for systems, devices, apparatus, methods, and computer program products for providing contact information via a computer network in response to activating an activatable indicium on a user interface. The activatable indicium integrates and provides the contact information for multiple channels of an entity along with statistical information for multiple contact options associated with each channel, and thus enables a user to contact an agent associated with the entity in a faster, more efficient, and better informed manner.

Abstract: Embodiments of the invention provide for systems, devices, apparatus, methods, and computer program products for providing an activatable indicium configured as an entry point for accessing contact information on a user interface. The activatable indicium, which may be a company logo, company name or the like, is not initially readily identifiable as an entry point for accessing the contact information. However, over time and continual use, the user recognizes that the presentation of the indicium regardless of the platform provides for an entry point for accessing contact information.

Abstract: Embodiments of the invention provide for systems, devices, apparatus, methods, and computer program products for allowing a first agent associated with an entity to initiate contact with a second agent associated with the entity via a contact entry point. The contact entry point is displayed on an interface page and enables a first agent to contact other agents associated with the entity in a faster, more efficient, and better informed manner.