Abstract: A method of monitoring a respiratory stream can be provided by monitoring color change of a color change material to determine a CO2 level of the respiratory stream in contact with the color change material by emitting visible light onto the color change material. Related devices, systems, and compositions are also disclosed.

Abstract: A method of monitoring a respiratory stream can be provided by monitoring color change of a color change material to determine a CO2 level of the respiratory stream in contact with the color change material by emitting visible light onto the color change material. Related devices, systems, and compositions are also disclosed.

Abstract: A method of detecting a level of anesthesia agent in an anesthesia vaporizer is disclosed. The anesthesia agent forms a column of liquid within an external indicator; the method projects a beam of light into the external indicator. The method further receives the beam of light after the beam of light has traveled through the column of liquid, and detects when the level of anesthesia agent drops below a predetermined level.

Abstract: A method of monitoring a respiratory stream can be provided by monitoring color change of a color change material to determine a CO2 level of the respiratory stream in contact with the color change material by emitting visible light onto the color change material. Related devices, systems, and compositions are also disclosed.

Abstract: A method of monitoring a respiratory stream can be provided by monitoring color change of a color change material to determine a CO2 level of the respiratory stream in contact with the color change material by emitting visible light onto the color change material. Related devices, systems, and compositions are also disclosed.

Abstract: A method of detecting a level of anesthesia agent in an anesthesia vaporizer is disclosed. The anesthesia agent forms a column of liquid within an external indicator; the method projects a beam of light into the external indicator. The method further receives the beam of light after the beam of light has traveled through the column of liquid, and detects when the level of anesthesia agent drops below a predetermined level.

Abstract: Positive resists sensitive to UV, electron beam, and x-ray radiation which are alkaline developable are formulated from a polymer material comprising recurrent structures having alkaline soluble groups pendent to the polymer backbone, a portion of which groups are substituted with acid labile groups.

Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.

Abstract: A process for the stoichiometric carbonation of a hydroxyaromatic material is provided which comprises the steps of (a) mixing together in a reaction vessel (1) a hydroxyaromatic material, (2) a sufficient amount of a dialkyl dicarbonate to give the desired degree of substitution, (3) a catalytic amount of an unhindered tertiary amine, and (4) a solvent, (b) stirring the reaction mixture, (c) precipitating the alkyl carbonate of the hydroxyaromatic material, and (d) recovering the alkyl carbonate of the hydroxyaromatic material.

Abstract: Positive resists sensitive to UV, electron beam, and x-ray radiation which are alkaline developable are formulated from a polymer material comprising recurrent structures having alkaline soluble groups pendent to the polymer backbone, a portion of which groups are substituted with acid labile groups.

Abstract: A method is described for reducing linewidth variations in the patterning of photoresists having non-uniform film thickness, comprising overcoating the photoresist with sufficient thickness of a nonreactive coating composition having a refractive index which within .+-.15 percent of that of the refractive index of the photoreist composition; said overcoating being of sufficient thickness such that it will result in about a one wave length phase lag between the oblique rays and the normal incident rays reflecting back from the substrate, upon arriving back at the resist surface. The effective thickness of the overcoating is a function of the exposure wavelength and the size of the numerical aperture of the objective lens used for expose. The overcoating compositions capable of providing the so defined refractive indices ranges, are described. For example, a polyacrylic acid coating composition having a refractive index of 1.5 at a thickness of 2.0 .mu.

Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.