Abstract: This disclosure discloses various dispensation devices for dispensation of various volumes of content. For example, some of such content can include cream.

Abstract: A system and method for extending the life of a cathode and repeller in an IHC ion source is disclosed. The system monitors the health of the cathode by operating using a known set of parameters and measuring the bias power used to generate the desired extracted beam current or the desired current from the arc voltage power supply. Based on the measured bias power, the system may determine whether the cathode is becoming too thin, and may take a corrective action. This corrective action may be to alert the operator; to operate the IHC ion source using a predetermined set of parameters; or to change the dilution used within the IHC source. By performing these actions, the life of the cathode may be more than doubled.

Abstract: An active grille shutter arrangement having an assembled modular frame with a plurality of primary frame pieces formed by extrusion. Each one of the plurality of primary frame pieces has a first end, a second end and at least one key slot extending between the first end and the second end. Each of the plurality of frame pieces also includes a hollow bore extending through the each one of the plurality of primary frame pieces forming an aperture at the first end and an aperture at the second end. When the modular frame is assembled there is an upper frame portion and lower frame portion, both formed from one of the plurality of primary frame pieces. The arrangement also includes a number of alternate frame and vane pieces that allow several different active grille shapes and configurations to be formed.

Abstract: A system and method for extending the life of a cathode and repeller in an IHC ion source is disclosed. The system monitors the health of the cathode by operating using a known set of parameters and measuring the bias power used to generate the desired extracted beam current or the desired current from the arc voltage power supply. Based on the measured bias power, the system may determine whether the cathode is becoming too thin, and may take a corrective action. This corrective action may be to alert the operator; to operate the IHC ion source using a predetermined set of parameters; or to change the dilution used within the IHC source. By performing these actions, the life of the cathode may be more than doubled.

Abstract: An active grille shutter arrangement having an assembled modular frame with a plurality of primary frame pieces formed by extrusion. Each one of the plurality of primary frame pieces has a first end, a second end and at least one key slot extending between the first end and the second end. Each of the plurality of frame pieces also includes a hollow bore extending through the each one of the plurality of primary frame pieces forming an aperture at the first end and an aperture at the second end. When the modular frame is assembled there is an upper frame portion and lower frame portion, both formed from one of the plurality of primary frame pieces. The arrangement also includes a number of alternate frame and vane pieces that allow several different active grille shapes and configurations to be formed.

Abstract: A database of oil and/or gas wells, and system which determines distances of activities performed on one or more oil and/or gas wells and the oil and/or gas wells offset to the activity(ies), provides electronic, interface, or physical notifications offset well operators of actions that might affect the offset operators' wells, and to find information about upcoming well activity(ies) that could affect offset wells. The activities can be hydraulic fracturing.

Abstract: An apparatus an ion beam generator to provide an ion beam. A scanning system may receive the ion beam and provide a scanned beam. An electrode may receive the scanned beam. At least a portion of the electrode is normal to a propagation direction of the scanned beam. The portion of the electrode that is normal to the propagation direction the scan beam may have a curved shape.

Abstract: A technique for ion implanting a target is disclosed. In accordance with one exemplary embodiment, the technique may be realized as a method for ion implanting a target, the method comprising: providing a predetermined amount of processing gas in an arc chamber of an ion source, the processing gas containing implant species and implant species carrier, where the implant species carrier may be one of O and H; providing a predetermined amount of dilutant into the arc chamber, wherein the dilutant may comprise a noble species containing material; and ionizing the processing gas and the dilutant.

Abstract: An ion source and method of cleaning are disclosed. One or more heating units are placed in close proximity to the inner volume of the ion source, so as to affect the temperature within the ion source. In one embodiment, one or more walls of the ion source have recesses into which heating units are inserted. In another embodiment, one or more walls of the ion source are constructed of a conducting circuit and an insulating layer. By utilizing heating units near the ion source, it is possible to develop new methods of cleaning the ion source. Cleaning gas is flowed into the ion source, where it is ionized, either by the cathode, as in normal operating mode, or by the heat generated by the heating units. The cleaning gas is able to remove residue from the walls of the ion source more effectively due to the elevated temperature.

Abstract: A technique for ion implanting a target is disclosed. In accordance with one exemplary embodiment, the technique may be realized as a method for ion implanting a target, the method comprising: providing a predetermined amount of processing gas in an arc chamber of an ion source, the processing gas containing implant species and implant species carrier, where the implant species carrier may be one of O and H; providing a predetermined amount of dilutant into the arc chamber, wherein the dilutant may comprise a noble species containing material; and ionizing the processing gas and the dilutant.

Abstract: An arrangement (1) for the electrical earthing of an electrically conducting cable (2) with an outer insulating protective cover (3). The arrangement comprises a receiver (4) and a drop unit (5). The receiver (4) comprises a bottom element (6), two opposing side elements (7a, 7b), two opposing open sides (8a, 8b). The bottom element (6) and the side elements (7a, 7b) form together a cleft (9), which cleft (9) is the receiver of the said cable (2) for earthing. The drop unit (5) comprises not only a connection to earth (10), but also a penetration means (11), which connection to earth (10) and penetration means (11) are in electrical contact with each other.

Abstract: An ion source has an arc chamber with an electron-emitting element and a repeller. A manifold assembly defines a cavity and a gas outlet configured to allow gas flow to the arc chamber. This gas outlet is closer to the repeller than the electron-emitting element. In one embodiment, the ion source has a first crucible and a second crucible. The first crucible and the second crucible are connected to the manifold assembly. In one instance, the crucibles have tamper-resistant features.

Abstract: An ion source and method of cleaning are disclosed. One or more heating units are placed in close proximity to the inner volume of the ion source, so as to affect the temperature within the ion source. In one embodiment, one or more walls of the ion source have recesses into which heating units are inserted. In another embodiment, one or more walls of the ion source are constructed of a conducting circuit and an insulating layer. By utilizing heating units near the ion source, it is possible to develop new methods of cleaning the ion source. Cleaning gas is flowed into the ion source, where it is ionized, either by the cathode, as in normal operating mode, or by the heat generated by the heating units. The cleaning gas is able to remove residue from the walls of the ion source more effectively due to the elevated temperature.

Abstract: An ion source has an arc chamber with an electron-emitting element and a repeller. A manifold assembly defines a cavity and a gas outlet configured to allow gas flow to the arc chamber. This gas outlet is closer to the repeller than the electron-emitting element. In one embodiment, the ion source has a first crucible and a second crucible. The first crucible and the second crucible are connected to the manifold assembly. In one instance, the crucibles have tamper-resistant features.

Abstract: An arrangement (1) for the electrical earthing of an electrically conducting cable (2) with an outer insulating protective cover (3). The arrangement comprises a receiver (4) and a drop unit (5). The receiver (4) comprises a bottom element (6), two opposing side elements (7a, 7b), two opposing open sides (8a, 8b). The bottom element (6) and the side elements (7a, 7b) form together a cleft (9), which cleft (9) is the receiver of the said cable (2) for earthing. The drop unit (5) comprises not only a connection to earth (10), but also a penetration means (11), which connection to earth (10) and penetration means (11) are in electrical contact with each other.

Abstract: Techniques for shaping an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for shaping an ion beam. The apparatus may comprise an entrance electrode biased at a first voltage potential, wherein an ion beam enters the entrance electrode, an exit electrode biased at a second voltage potential, wherein the ion beam exits the exit electrode, and a first suppression electrode and a second suppression electrode positioned between the entrance electrode and the exit electrode, wherein the first suppression electrode and the second suppression electrode are independently biased to variably focus the ion beam.

Abstract: A technique for shaping a ribbon-shaped ion beam is disclosed. In one particular exemplary embodiment, the technique may be realized as an apparatus for shaping a ribbon-shaped ion beam. The apparatus may comprise an electrostatic lens having a substantially rectangular aperture for a ribbon-shaped ion beam to pass through, wherein a plurality of focusing elements are positioned along short edges of the aperture, and wherein each focusing element is separately biased and oriented to shape the ribbon-shaped ion beam.

Abstract: Apparatus and methods for automatically processing and displaying information for managing equipment or services in a network. The information is automatically inserted into a hierarchical data structure, which can then presented in a ticker display for viewing by a user. The information concerning the network equipment or services may also be used to determine the users affected by particular network failures.