Patents by Inventor Robert M. Park

Robert M. Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5984602
    Abstract: A reversible threaded fastener system which provides holding of a nut in a f ully conjoined state with respect to a bolt, yet the interrelationship therebetween is fully reversible and is accomplished without friction and without inelastic deformation. Included is a bolt having a threaded shank, a nut having a threaded bore for being threadably engaged on the threaded shank of the bolt, and a washer non-rotatably interfaced with the shank and provided with a plurality of radial washer waves. The washer is held in non-rotatable relation with respect to the bolt by the shank and the bore of the washer being mutually asymmetric. In a first preferred embodiment, the inner face of the nut is provided with a plurality of radial nut waves which correspond to the washer waves, and the washer is resiliently deformable.
    Type: Grant
    Filed: September 14, 1998
    Date of Patent: November 16, 1999
    Inventor: Robert M. Park
  • Patent number: 5574296
    Abstract: An electromagnetic radiation transducer is provided having a p-type ZnSe layer and an n-type layer. The p-type ZnSe layer has a net donor to net acceptor ratio (N.sub.D /N.sub.A) of less than or equal to about 0.8. The net acceptor concentration is greater than about 5.times.10.sup.15 cm .sup.-3 and the resistivity is less than 15 .OMEGA.-cm. The p-type ZnSe layer is deposited by doping the ZnSe during fabrication with a neutral free-radical source.
    Type: Grant
    Filed: July 21, 1993
    Date of Patent: November 12, 1996
    Assignee: Minnesota Mining And Manufacturing Company
    Inventors: Robert M. Park, James M. DePuydt, Hwa Cheng, Michael A. Haase
  • Patent number: 5248631
    Abstract: A method and apparatus for enhanced doping of IIB-VIA semiconductors through the use of a free-radical source is described. The process involves the simultaneous production of beams of free-radicals together with group IIB molecules or atoms and group VIA molecules or atoms in a standard molecular beam epitaxy crystal growth system. These beams react on a substrate producing single crystal films of doped IIB-VIA semiconductors such as ZnSe:N, for example. The improved doping characteristics result from the high reactivity of radicals produced by the free-radical source with the surface of the growing crystal.
    Type: Grant
    Filed: August 24, 1990
    Date of Patent: September 28, 1993
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Robert M. Park, James M. DePuydt, Hwa Cheng, Michael A. Haase