Abstract: An ESD protection device can include a silicon-controlled rectifier (SCR) and an external pumping circuit. The external pumping circuit can be used to forward bias a junction of the SCR. The external pumping circuit can comprise a transistor that can be coupled to a region of the SCR to pump the region.

Abstract: The present invention provides a system for electrostatic discharge protection in a semiconductor device, utilizing a silicon-controlled rectifier (502). The system includes the silicon controlled rectifier, which has a first p-type region (508) coupled to a voltage node (504), a first n-type region (512) having a first side adjoining the first p-type region, a second p-type region (510) having a first side adjoining a second side of the first n-type region, and a second n-type region (514) having a first side adjoining a second side of the second p-type region. A clamping structure (506) is intercoupled between the second n-type region and ground, to prevent the junction between the second p-type region and the second n-type region from retaining a forward bias. A switching structure (518) is intercoupled between the second p-type region and ground to ground the second p-type region during normal operation of the semiconductor device.

Abstract: The present invention provides a system for electrostatic discharge protection in a semiconductor device, utilizing a silicon-controlled rectifier (502). The system includes the silicon controlled rectifier, which has a first p-type region (508) coupled to a voltage node (504), a first n-type region (512) having a first side adjoining the first p-type region, a second p-type region (510) having a first side adjoining a second side of the first n-type region, and a second n-type region (514) having a first side adjoining a second side of the second p-type region. A clamping structure (506) is intercoupled between the second n-type region and ground, to prevent the junction between the second p-type region and the second n-type region from retaining a forward bias. A switching structure (518) is intercoupled between the second p-type region and ground to ground the second p-type region during normal operation of the semiconductor device.

Abstract: An equipment (400) for testing semiconductor device performance under high energy pulse conditions, which comprises a high voltage generator (401) and an on/off switch relay (403). The relay is resistively connected by a first resistor (402) to the generator and by a second resistor (404) to the socket (405a) for the device-under-test (406); the relay is operable in a partially ionized ambient. A capacitor (407) is connected to the relay, to the generator, and to the device, and is operable to discharge high energy pulses through the device. A third resistor (410) is in parallel with the capacitor and the device, and is operable to suppress spurious pulses generated by the relay. This third resistor has a value between about 1 k? and 1 M?, preferably about 10 k?, several orders of magnitude greater than the on-resistance of the device-under-test.