Patents by Inventor Robert Max EGERMAN

Robert Max EGERMAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • EUV RADIATION SOURCE AND POSITION-CONTROLLABLE MIRROR
    Publication number: 20260262156
    Abstract: An EUV radiation source comprising a laser configured to emit a laser beam, and an optical system configured to control a position of the laser beam such that it is incident upon fuel droplets, wherein the optical system comprises an optical path which includes a position-controllable mirror having a control bandwidth of at least 500 Hz.
    Type: Application
    Filed: March 1, 2024
    Publication date: September 3, 2026
    Applicant: ASML Netherlands B.V.
    Inventors: Robert Rens WAIBOER, Dieter Emmanuel LAMBREGTS, Jordy NIEUWHOFF, Jasper WINTERS, Albert DEKKER, Kodai HATAKEYAMA, Robert Jan VOORHOEVE, Robert Max EGERMAN