Abstract: A measurement technique based on a microwave near-field scanning probe is developed for non-contact measurement of dielectric constant of low-k films. The technique is non-destructive, non-invasive and can be used on both porous and non-porous dielectrics. The technique is based on measurement of resonant frequency shift of the near-field microwave resonator for a plurality of calibration samples vs. distance between the probe tip and the sample to construct a calibration curve. Probe resonance frequency shift measured for the sample under study vs. tip-sample separation is fitted into the calibration curve to extract the dielectric constant of the sample under study. The calibration permits obtaining a linear calibration curve in order to simplify the extraction of the dielectric constant of the sample under study.

Abstract: An apparatus for localized measurements of complex permittivity of a material is provided. A probe (10) analyzes the complex permittivity of a sample (11), the probe (10) having a balanced two conductor transmission line (12) formed of conductive segments (13 and 14). A probing end (15) of the transmission line (12) is brought within close proximity of sample (11) and an opposite end (16) of the transmission line is connected to a terminating plate (17) to form a resonator structure (18) for measurement of the complex permittivity of sample (11).