Patents by Inventor Robert Paul Ebeling

Robert Paul Ebeling has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Device, lithographic apparatus, method for guiding radiation and device manufacturing method
    Patent number: 9715183
    Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.
    Type: Grant
    Filed: January 24, 2013
    Date of Patent: July 25, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Wouter Dick Koek, Arno Jan Bleeker, Erik Roelof Loopstra, Heine Melle Mulder, Erwin John Van Zwet, Dries Smeets, Robert Paul Ebeling
  • DEVICE, LITHOGRAPHIC APPARATUS, METHOD FOR GUIDING RADIATION AND DEVICE MANUFACTURING METHOD
    Publication number: 20140347641
    Abstract: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having a programmable patterning device that comprises a plurality of radiation emitters, configured to provide a plurality of radiation beams; and a projection system, comprising a stationary part and a moving part, configured to project the plurality of radiation beams onto locations on a target that are selected based on a pattern, wherein at least one of the radiation emitters comprises a waveguide configured to output a radiation beam that comprises unpolarized and/or circularly polarized radiation.
    Type: Application
    Filed: January 24, 2013
    Publication date: November 27, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Wouter Dick Koek, Arno Jan Bleeker, Erik Roelof Loopstra, Heine Melle Mulder, Erwin John Van Zwet, Dries Smeets, Robert Paul Ebeling