Patents by Inventor Robert Plass

Robert Plass has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7601482
    Abstract: The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1, where, R? is selected independently from hydrogen, (C1-C4)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure 1, where, W is a multivalent linking group, R1 to R6 are independently selected from hydrogen, hydroxyl, (C1-C20) alkyl and chlorine, X1 and X2 are independently oxygen or N—R7, where R7 is hydrogen or (C1-C20) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition.
    Type: Grant
    Filed: March 28, 2006
    Date of Patent: October 13, 2009
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Georg Pawlowski, Chunwei Chen, Joseph Oberlander, Robert Plass
  • Publication number: 20070231735
    Abstract: The present invention relates to a negative photoresist composition comprising, a) at least one alkali-soluble polymer, where the polymer comprises at least one unit of structure 1, where, R? is selected independently from hydrogen, (C1-C4)alkyl, chlorine, bromine and m is an integer from 1 to 4; b) at least one monomer of structure 1, where, W is a multivalent linking group, R1 to R6 are independently selected from hydrogen, hydroxyl, (C1-C20) alkyl and chlorine, X1 and X2 are independently oxygen or N—R7, where R7 is hydrogen or (C1-C20) alkyl, and n is and integer equal to or greater than 1, and c) at least one photoinitiator. The invention also relates to a process for imaging the negative photoresist composition.
    Type: Application
    Filed: March 28, 2006
    Publication date: October 4, 2007
    Inventors: Georg Pawlowski, Chunwei Chen, Joseph Oberlander, Robert Plass
  • Patent number: 7042029
    Abstract: A solid state p-n heterojunction comprising an electron conductor and a hole conductor; it further comprises a sensitising semiconductor, said sensitizing semiconductor being located at an interface between said electron conductor and said hole conductor. In particular, the sensitizing semiconductor is in form of quantum-dots. A solid state sensitized photovoltaic cell comprises such a heterojunction between two electrodes.
    Type: Grant
    Filed: July 6, 2004
    Date of Patent: May 9, 2006
    Assignee: Ecole Polytechnique Federale de Lausanne (EPFL)
    Inventors: Michael Graetzel, Robert Plass, Udo Bach
  • Patent number: 6861722
    Abstract: A solid state p-n heterojunction comprising an electron conductor and a hole conductor; it further comprises a sensitising semiconductor, said sensitizing semiconductor being located at an interface between said electron conductor and said hole conductor. In particular, the sensitizing semiconductor is in form of quantum-dots. A solid state sensitized photovoltaic cell comprises such a layered heterojunction between two electrodes.
    Type: Grant
    Filed: July 30, 2001
    Date of Patent: March 1, 2005
    Assignee: Ecole Polytechnique Federale de Lausanne
    Inventors: Michael Graetzel, Robert Plass, Udo Bach
  • Publication number: 20050006714
    Abstract: A solid state p-n heterojunction comprising an electron conductor and a hole conductor; it further comprises a sensitising semiconductor, said sensitizing semiconductor being located at an interface between said electron conductor and said hole conductor. In particular, the sensitizing semiconductor is in form of quantum-dots. A solid state sensitized photovoltaic cell comprises such a heterojunction between two electrodes.
    Type: Application
    Filed: July 6, 2004
    Publication date: January 13, 2005
    Inventors: Michael Graetzel, Robert Plass, Udo Bach
  • Publication number: 20030092246
    Abstract: Disclosed is an assembly system for stationing a semiconductor wafer suitable for processing said wafer, said system comprising: (a) a holding block; (b) a semiconductor wafer; and (c) an aqueous adhesive composition interposed between said ceramic block and said semiconductor wafer, said adhesive composition comprising water; at least one release agent selected from the group consisting of polyethylene glycols, fluorine-free ethoxylated surfactants, fluorosurfacants, and silicone polymers; and at least one resin selected from the group consisting of (meth)acrylic acid or (meth)acrylate based polymers, vinyl acetate polymers, rosin-modified maleic resins, novolak resins, and polymers represented by the formula 1
    Type: Application
    Filed: October 11, 2001
    Publication date: May 15, 2003
    Inventors: Stanley F. Wanat, Robert Plass
  • Publication number: 20020017656
    Abstract: A solid state p-n heterojunction comprising an electron conductor and a hole conductor; it further comprises a sensitising semiconductor, said sensitizing semiconductor being located at an interface between said electron conductor and said hole conductor. In particular, the sensitizing semiconductor is in form of quantum-dots. A solid state sensitized photovoltaic cell comprises such a layered heterojunction between two electrodes.
    Type: Application
    Filed: July 30, 2001
    Publication date: February 14, 2002
    Inventors: Michael Graetzel, Robert Plass, Udo Bach