Patents by Inventor Robert Pui Chi Fung

Robert Pui Chi Fung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for drying a substrate
    Publication number: 20040011387
    Abstract: A method and apparatus for drying a disk-shaped substrate. The substrate is typically a substrate used for the manufacture of magnetic disks, and has a centrally located opening. The substrate is lowered into a liquid bath by a first holder, which also becomes immersed in the bath. The first holder lifts the substrate until the substrate extends partially out of contact with the liquid. A second, dry holder grabs a dry portion of the substrate that extends out of the bath, and continues to lift the substrate out of contact with the liquid.
    Type: Application
    Filed: March 24, 2003
    Publication date: January 22, 2004
    Applicant: Komag, Inc.
    Inventors: Michael Rosano, Muhammad Asif, Robert Pui Chi Fung
  • Method for drying a substrate
    Patent number: 6571806
    Abstract: A method for drying a disk-shaped substrate. The substrate is typically a substrate used for the manufacture of magnetic disks, and has a centrally located opening. The substrate is lowered into a liquid bath by a first holder, which also becomes immersed in the bath. The first holder lifts the substrate until the substrate extends partially out of contact with the liquid. A second, dry holder grabs a dry portion of the substrate that extends out of the bath, and continues to lift the substrate out of contact with the liquid.
    Type: Grant
    Filed: April 17, 2001
    Date of Patent: June 3, 2003
    Assignee: Komag, Inc.
    Inventors: Michael Rosano, Muhammad Asif, Robert Pui Chi Fung
  • Method and apparatus for drying a substrate
    Publication number: 20020083967
    Abstract: A method and apparatus for drying a disk-shaped substrate. The substrate is typically a substrate used for the manufacture of magnetic disks, and has a centrally located opening. The substrate is lowered into a liquid bath by a first holder, which also becomes immersed in the bath. The first holder lifts the substrate until the substrate extends partially out of contact with the liquid. A second, dry holder grabs a dry portion of the substrate that extends out of the bath, and continues to lift the substrate out of contact with the liquid.
    Type: Application
    Filed: April 17, 2001
    Publication date: July 4, 2002
    Inventors: Michael Rosano, Muhammad Asif, Robert Pui Chi Fung
  • Method for drying a substrate
    Patent number: 6216709
    Abstract: A method for drying workpieces in accordance with our invention includes the step of immersing the workpieces in a liquid, holding the workpieces with a first holding mechanism, slowly draining the liquid from the container until a first portion of the workpieces is exposed and dried, holding the workpieces with a second holding means at the first portion, and draining the remainder of the liquid from the container. Because of this, a drying portion of the workpiece is not held by a wet holding mechanism.
    Type: Grant
    Filed: November 3, 1998
    Date of Patent: April 17, 2001
    Assignee: Komag, Inc.
    Inventors: Robert Pui Chi Fung, David Paul Musser, Jonathan Sanghun Cho