Abstract: A falling film plasma reactor (FFPR) provides a number of benefits for the treatment of process gases. The falling film plasma reactor uses high voltage alternating current or pulsed direct current which is applied to radially separated electrodes to thereby create a dielectric breakdown of the process gas that is flowing within the large radial gap between the two electrodes. Typical plasma reactors often utilize fixed dielectric construction which can result in potential failure of the device by arcing between the electrodes as portions of the dielectric fail. Such failures are prevented by using a dielectric liquid that constantly flows over the electrodes, or over a fixed dielectric barrier over the electrodes.

Abstract: A method and apparatus for the extraction of particles from surfaces is disclosed. A preferred method comprises the steps of (1) adjusting the temperature and humidity of an air supply to provide an adjusted air supply, (2) directing a blast from the adjusted air supply to a surface bearing particles, so as to produce a deflected blast that comprises some of the particles from the surface, (3) collecting the deflected blast and particles, and (4) directing the deflected blast and particles towards an analyzer. A preferred apparatus includes an air adjuster and a probe comprising an adjusted air supply passage, an adjusted air aperture, a deflected air aperture, and a deflected air passage, wherein the air adjuster is adapted to provide a flow of adjusted air to the adjusted air supply passage and the adjusted air aperture.

Abstract: A falling film plasma reactor (FFPR) provides a number of benefits for the treatment of process gases. The falling film plasma reactor uses high voltage alternating current or pulsed direct current which is applied to radially separated electrodes to thereby create a dielectric breakdown of the process gas that is flowing within the large radial gap between the two electrodes. Typical plasma reactors often utilize fixed dielectric construction which can result in potential failure of the device by arcing between the electrodes as portions of the dielectric fail. Such failures are prevented by using a dielectric liquid that constantly flows over the electrodes, or over a fixed dielectric barrier over the electrodes.

Abstract: An apparatus is provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture and flame production within a reaction chamber. The reaction chamber is heated by heating elements and has an interior wall with orifices through which heated air enters into the central reaction chamber. The oxidized gases are treated also for particles removal by flowing through a packed bed. The packed bed is cooled and its upper portion with air inlets to enhance condensation and particle growth in the bed. The treated gas stream is also scrubbed in a continuous regenerative scrubber comprising at least two vertically separated beds in which one bed can be regenerated while the other is operative so that the flow may be continuously passed through the bed.

Abstract: A falling film plasma reactor (FFPR) provides a number of benefits for the treatment of process gases. The falling film plasma reactor uses high voltage alternating current or pulsed direct current which is applied to radially separated electrodes to thereby create a dielectric breakdown of the process gas that is flowing within the large radial gap between the two electrodes. Typical plasma reactors often utilize fixed dielectric construction which can result in potential failure of the device by arcing between the electrodes as portions of the dielectric fail. Such failures are prevented by using a dielectric liquid that constantly flows over the electrodes, or over a fixed dielectric barrier over the electrodes.

Abstract: A method and apparatus for sorting and performing redundant analysis of particles in an aerosol is disclosed. Redundant analysis reduces the possibility of false positive analyses, which is advantageous in the art. The apparatus may comprise an aerosol concentrator, an optical particle analyzer, an electrosprayer and a charged particle analyzer. A method according to the invention may comprise delivering a concentrated aerosol stream to an optical particle analyzer; analyzing each particle of interest and selectively triggering an electrosprayer to electrospray each particle of interest; adding a charge to the particle, which is then moved by electrostatic forces to a charged particle analyzer; and performing a second, redundant analysis of each charged particle collected on the charged particle analyzer to confirm the identity of the particle of interest. The apparatus and method may also be adapted to perform redundant analysis of disguised particles that are coated to disguise their payload.

Abstract: A method and apparatus for the extraction of particles from surfaces is disclosed. A preferred method comprises the steps of (1) adjusting the temperature and humidity of an air supply to provide an adjusted air supply, (2) directing a blast from the adjusted air supply to a surface bearing particles, so as to produce a deflected blast that comprises some of the particles from the surface, (3) collecting the deflected blast and particles, and (4) directing the deflected blast and particles towards an analyzer. A preferred apparatus includes an air adjuster and a probe comprising an adjusted air supply passage, an adjusted air aperture, a deflected air aperture, and a deflected air passage, wherein the air adjuster is adapted to provide a flow of adjusted air to the adjusted air supply passage and the adjusted air aperture. The flow may be continuous, intermittent, pulsed or periodic.

Abstract: A method and apparatus for sorting and performing redundant analysis of particles in an aerosol is disclosed. Redundant analysis reduces the possibility of false positive analyses, which is advantageous in the art. The apparatus may comprise an aerosol concentrator, an optical particle analyzer, an electrosprayer and a charged particle analyzer. A method according to the invention may comprise delivering a concentrated aerosol stream to an optical particle analyzer; analyzing each particle of interest and selectively triggering an electrosprayer to electrospray each particle of interest; adding a charge to the particle, which is then moved by electrostatic forces to a charged particle analyzer; and performing a second, redundant analysis of each charged particle collected on the charged particle analyzer to confirm the identity of the particle of interest. The apparatus and method may also be adapted to perform redundant analysis of disguised particles that are coated to disguise their payload.

Abstract: An apparatus is provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture and flame production within a reaction chamber. The reaction chamber is heated by heating elements and has an interior wall with orifices through which heated air enters into the central reaction chamber. The oxidized gases are treated also for particles removal by flowing through a packed bed. The packed bed is cooled and its upper portion with air inlets to enhance condensation and particle growth in the bed. The treated gas stream is also scrubbed in a continuous regenerative scrubber comprising at least two vertically separated beds in which one bed can be regenerated while the other is operative so that the flow may be continuously passed through the bed.

Abstract: A falling film plasma reactor (FFPR) provides a number of benefits for the treatment of process gases. The falling film plasma reactor uses high voltage alternating current or pulsed direct current which is applied to radially separated electrodes to thereby create a dielectric breakdown of the process gas that is flowing within the large radial gap between the two electrodes. Typical plasma reactors often utilize fixed dielectric construction which can result in potential failure of the device by arcing between the electrodes as portions of the dielectric fail. Such failures are prevented by using a dielectric liquid that constantly flows over the electrodes, or over a fixed dielectric barrier over the electrodes.

Abstract: A falling film plasma reactor (FFPR) provides a number of benefits for the treatment of process gases. The falling film plasma reactor uses high voltage alternating current or pulsed direct current which is applied to radially separated electrodes to thereby create a dielectric breakdown of the process gas that is flowing within the large radial gap between the two electrodes. Typical plasma reactors often utilize fixed dielectric construction which can result in potential failure of the device by arcing between the electrodes as portions of the dielectric fail. Such failures are prevented by using a dielectric liquid that constantly flows over the electrodes, or over a fixed dielectric barrier over the electrodes.

Abstract: An apparatus is provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture and flame production within a reaction chamber. The reaction chamber is heated by heating elements and has an interior wall with orifices through which heated air enters into the central reaction chamber. The oxidized gases are treated also for particles removal by flowing through a packed bed. The packed bed is cooled and its upper portion with air inlets to enhance condensation and particle growth in the bed. The treated gas stream is also scrubbed in a continuous regenerative scrubber comprising at least two vertically separated beds in which one bed can be regenerated while the other is operative so that the flow may be continuously passed through the bed.

Abstract: An apparatus is provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture and flame production within a reaction chamber. The reaction chamber is heated by heating elements and has an interior wall with orifices through which heated air enters into the central reaction chamber. The oxidized gases are treated also for particles removal by flowing through a packed bed. The packed bed is cooled and its upper portion with air inlets to enhance condensation and particle growth in the bed. The treated gas stream is also scrubbed in a continuous regenerative scrubber comprising at least two vertically separated beds in which one bed can be regenerated while the other is operative so that the flow may be continuously passed through the bed.

Abstract: An apparatus is provided for treating pollutants in a gaseous stream. The apparatus employs curved tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture and flame production within a reaction chamber. The reaction chamber is heated by annular heating elements and has an interior wall with orifices through which heated air enters into the central reaction chamber. The oxidized gases are treated also for particles removal by flowing through a packed bed. The packed bed is cooled and its upper portion with air inlets to enhance condensation and particle growth in the bed. The treated gas stream is also scrubbed in a continuous regenerative scrubber employing at least two vertically separated beds in which one bed can be regenerated while the other is operative so that the flow may be continuously passed through the bed.

Abstract: A submicron filter assembly (24) is added to an exhaust gas controlled destruction and oxidation unit (10). Controlled destruction and oxidation unit (10) treats exhaust gas from at least one semiconductor wafer fabricating reactor. The submicron filter (24) filters submicron particles out of the treated exhaust gas to prevent visible plumes from forming in wafer fab exhaust systems (stacks). The controlled destruction and oxidation unit (10) and submicron filter assembly (24) are ideally suited for use at the point of generation of the exhaust gases. In one embodiment of the invention, the submicron filter assembly comprises an electrostatic filter (26). The electrostatic filter (26) includes a positively charged first grid (28) and a grounded second grid (30). The second grid may include a mist screen for removing particulate build-up. In another embodiment of the invention, the submicron filter assembly (36) comprises a mist eliminator (38) and a HEPA filter (40).

Abstract: An apparatus for use in arthroscopically attaching a suture to bone comprises a cannula and drill guide for use in drilling parallel holes in the bone and a scissors-like component for carrying a suture down one hole and pushing the suture through soft bone into the other hole where it can be retrieved.

Abstract: An apparatus for use in arthroscopically attaching a suture to bone comprises a cannula and drill guide for use in drilling parallel holes in the bone and a scissors-like component for carrying a suture down one hole and pushing the suture through soft bone into the other hole where it can be retrieved.

Abstract: A surgery table utilizing a frame member which is supported on a ground surface, A platform is connected to the frame member and includes a laterally movable portion which supports a patient. The table also includes a torso support which is connected to and moves with the laterally movable portion of the platform. A leg support rotates relative to the platform and connects to a hip support which holds the patient's hip during such rotation.

Abstract: An apparatus for immobilizing a human shoulder, and for supporting the wrist of the arm associated with that shoulder, comprises three inflatable bladders joined together to form a triangular wedge. The wedge is positioned underneath the patient's arm such that one bladder is positioned along the patient's side, and such that the patient's arm rests on another of the bladders. The bladder that supports the patient's arm is provided with an inverted cup joined to an elongate step which supports the patient's hand and wrist.

Abstract: A method and apparatus for arthroscopic attachment of a suture to bone by drilling parallel holes in the bone with a cannula and drill guide and passing a suture down one hole through soft bone into the other hole and retrieving the suture through the second hole.