Patents by Inventor Robert Rafilevitch Gayazov

Robert Rafilevitch Gayazov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus, radiation system and device manufacturing method
    Patent number: 8018574
    Abstract: A foil trap is located in a path of a radiation beam. The foil trap includes an array of conductive strips. A voltage application circuit is coupled to the strips to apply voltage differences between pairs of adjacent ones of the strips. The voltage application circuit includes a current limiting circuit arranged to limit currents to the strips to values below a threshold value above which self-sustained arc discharge may arise in the foil trap.
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: September 13, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Robert Rafilevitch Gayazov, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Evgenii Dmitreevitch Korob, Konstantin Nikolaevitch Koshelev, Givi Georgievitch Zukavishvili, Yurii Victorovitch Sidelnikov
  • Radiation source, lithographic apparatus and device manufacturing method
    Patent number: 7528395
    Abstract: A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.
    Type: Grant
    Filed: September 17, 2003
    Date of Patent: May 5, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine, Vladimir Vital'Evitch Ivanov, Erik René Kieft, Erik Roelof Loopstra, Lucas Henricus Johannes Stevens, Yurii Victorovitch Sidelkov, Vsevolod Grigorevitch Koloshnikov, Vladimir Mihailovitch Krivtsun, Robert Rafilevitch Gayazov, Olav Waldemar Vladimir Frijns
  • Electromagnetic radiation source, lithographic apparatus, device manufacturing method and device manufactured thereby
    Patent number: 7462851
    Abstract: A device for generating radiation source based on a discharge includes a cathode and an anode. A discharge is created in a material comprising an alloy of two or more substances.
    Type: Grant
    Filed: September 22, 2006
    Date of Patent: December 9, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Robert Rafilevitch Gayazov, Vladimir Mihailovitch Krivtsun
  • Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
    Patent number: 7335900
    Abstract: A device for generating radiation or a source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.
    Type: Grant
    Filed: July 12, 2005
    Date of Patent: February 26, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Konstantin Nikolaevitch Koshelev, Vladimir Vitalevitch Ivanov, Evgenii Dmitreevitch Korob, Givi Georgievitch Zukavishvili, Robert Rafilevitch Gayazov, Vladimir Mihailovitch Krivtsun
  • Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
    Patent number: 7208746
    Abstract: A device for generating radiation source based on a discharge includes a cathode and an anode. The cathode and anode material are supplied in fluid state. The material forms a plasma pinch when the device is in use. Optionally, nozzles may be used to supply the material. The cathode and/or anode may form a flat surface. The trajectories of the material may be elongated. A laser may be used to cause the discharge more easily. The laser may be directed on the anode of cathode or on a separate material located in between the anode and cathode.
    Type: Grant
    Filed: July 14, 2004
    Date of Patent: April 24, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Konstantin Nikolaevitch Koshelev, Vladimir Vitalevitch Ivanov, Evgenii Dmitreevitch Korob, Givi Georgievitch Zukavishvili, Robert Rafilevitch Gayazov, Vladimir Mihailovitch Krivtsum
  • Radiation source, lithographic apparatus and device manufacturing method
    Publication number: 20040105082
    Abstract: A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.
    Type: Application
    Filed: September 17, 2003
    Publication date: June 3, 2004
    Applicant: ASML Netherlands B. V.
    Inventors: Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine, Vladimir Vital?apos;Evitch Ivanov, Erik Rene Kieft, Erik Roelof Loopstra, Lucas Henricus Johannes Stevens, Yurii Victorovitch Sidelkov, Vsevolod Grigorevitch Koloshnikov, Vladimir Mihailovitch Krivtsun, Robert Rafilevitch Gayazov, Olav Waldemar Vladimir Frijns