Abstract: A passive optical element is transferred into a substrate already having features with a vertical dimension thereon. The features may be another passive optical element, an active optical element, a dichroic layer, a dielectric layer, alignment features, metal portions. A protective layer is provided over the feature during the transfer of the optical element. One or more of these processes may be performed on a wafer level.

Abstract: A wavelength detector includes an optical structure receiving an input beam, the optical structure outputting at least two wavelength dependent two-beam interference signals. Each wavelength dependent two-beam interference signal has a different phase offset. A detector receives the at least two wavelength dependent two-beam interference signals and outputs an electrical signal representative of each wavelength dependent two-beam interference. A processor receives the at least two electrical signals from the detector and generates a composite control signal. The two-beam interference signals may be created by reflecting light off the two surfaces of the optical structure. The different phase offsets may be created by providing a stepped pattern on one of the surfaces of the optical structure. Phase shifting interferometry techniques may be used to determine the wavelength from the periodic signals.

Abstract: A passive optical element is transferred into a substrate already having features with a vertical dimension thereon. The features may be another passive optical element, an active optical element, a dichroic layer, a dielectric layer, alignment features, metal portions. A protective layer is provided over the feature during the transfer of the optical element. One or more of these processes may be performed on a wafer level.

Abstract: A wavelength detector includes a beam splitter block that taps off two spatially separated beams and a linear filter in an optical path of one of the two beams. The linear filter may be provided on the beam splitter block. The linear filter may be a notch anti-reflective filter in the optical path of the application beam. One or both of the beams may be focused on to their respective detectors.

Abstract: A wavelength detector includes an optical structure receiving an input beam, the optical structure outputting at least three wavelength dependent two-beam interference signals. Each wavelength dependent two-beam interference signal has a different phase offset. A detector receives the at least three wavelength dependent two-beam interference signals and outputs an electrical signal representative of each wavelength dependent two-beam interference. A processor receives the at least three electrical signals from the detector and generates a composite control signal. Alternatively, two of the three signals are periodic with respect to wavelength and the third signal is a reference signal. The two-beam interference signals may be created by providing patterned apertures in respective beam paths. Phase shifting interferometry techniques may be used to determine the wavelength from the periodic signals.

Abstract: A wavelength detector includes a beam splitter block that taps off two spatially separated beams and a linear filter in an optical path of one of the two beams. The linear filter may be provided on the beam splitter block. The linear filter may be a notch anti-reflective filter in the optical path of the application beam. One or both of the beams may be focused on to their respective detectors.

Abstract: A passive optical element is transferred into a substrate already having features with a vertical dimension thereon. The features may be another passive optical element, an active optical element, a dichroic layer, a dielectric layer, alignment features, metal portions. A protective layer is provided over the feature during the transfer of the optical element. One or more of these processes may be performed on a wafer level.

Abstract: A wavelength detector includes an optical structure receiving an input beam, the optical structure outputting at least two wavelength dependent two-beam interference signals. Each wavelength dependent two-beam interference signal has a different phase offset. A detector receives the at least two wavelength dependent two-beam interference signals and outputs an electrical signal representative of each wavelength dependent two-beam interference. A processor receives the at least two electrical signals from the detector and generates a composite control signal. The two-beam interference signals may be created by reflecting light off the two surfaces of the optical structure. The different phase offsets may be created by providing a stepped pattern on one of the surfaces of the optical structure. Phase shifting interferometry techniques may be used to determine the wavelength from the periodic signals.

Abstract: A wavelength detector includes an optical structure receiving an input beam, the optical structure outputting at least three wavelength dependent two-beam interference signals. Each wavelength dependent two-beam interference signal has a different phase offset. A detector receives the at least three wavelength dependent two-beam interference signals and outputs an electrical signal representative of each wavelength dependent two-beam interference. A processor receives the at least three electrical signals from the detector and generates a composite control signal. Alternatively, two of the three signals are periodic with respect to wavelength and the third signal is a reference signal. The two-beam interference signals may be created by providing patterned apertures in respective beam paths. Phase shifting interferometry techniques may be used to determine the wavelength from the periodic signals.